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1. (WO2006123643) MATERIAL FOR PROTECTIVE FILM FORMATION FOR LIQUID IMMERSION EXPOSURE PROCESS, AND METHOD FOR PHOTORESIST PATTERN FORMATION USING THE SAME
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2006/123643    International Application No.:    PCT/JP2006/309718
Publication Date: 23.11.2006 International Filing Date: 16.05.2006
IPC:
G03F 7/11 (2006.01), G03F 7/20 (2006.01), H01L 21/027 (2006.01)
Applicants: Tokyo Ohka Kogyo Co., Ltd. [JP/JP]; 150, Nakamaruko, Nakahara-ku, Kawasaki-shi, Kanagawa 2110012 (JP) (For All Designated States Except US).
YOSHIDA, Masaaki [JP/JP]; (JP) (For US Only).
ISHIDUKA, Keita [JP/JP]; (JP) (For US Only).
HIRANO, Tomoyuki [JP/JP]; (JP) (For US Only).
ANDO, Tomoyuki [JP/JP]; (JP) (For US Only)
Inventors: YOSHIDA, Masaaki; (JP).
ISHIDUKA, Keita; (JP).
HIRANO, Tomoyuki; (JP).
ANDO, Tomoyuki; (JP)
Agent: HASEGAWA, Yoko; #403, Horiguchi Bldg. 2-3, Nihombashi Ningyocho 2-chome Chuo-ku Tokyo 1030013 (JP)
Priority Data:
2005-144270 17.05.2005 JP
2005-344644 29.11.2005 JP
Title (EN) MATERIAL FOR PROTECTIVE FILM FORMATION FOR LIQUID IMMERSION EXPOSURE PROCESS, AND METHOD FOR PHOTORESIST PATTERN FORMATION USING THE SAME
(FR) MATÉRIAU POUR LA FORMATION D’UNE PELLICULE PROTECTRICE POUR UN PROCESSUS D’EXPOSITION PAR IMMERSION ET PROCÉDÉ DE FORMATION D’UN MOTIF PHOTORÉSISTANT UTILISANT CE MATÉRIAU
(JA) 液浸露光プロセス用保護膜形成用材料およびこれを用いたホトレジストパターン形成方法
Abstract: front page image
(EN)This invention provides a material for protective film formation for a liquid immersion exposure process, suitable for use in a liquid immersion exposure process, particularly a local exposure liquid immersion process for filling a liquid immersion medium into only between an exposure lens and a substrate comprising a protective film provided on a photoresist layer, the material for protective film formation being formed on a photoresist film, wherein the material for protective film formation comprises a cyclic fluoroalkyl polyether and a fluoro organic solvent, and a method for photoresist pattern formation using the material for protective film formation.
(FR)La présente invention concerne un matériau de formation d’une pellicule protectrice pour un processus d’exposition par immersion, adapté à l’utilisation dans un processus d’exposition par immersion, en particulier un processus d’exposition par immersion locale pour remplir un milieu d'immersion liquide seulement entre une lentille d'exposition et un substrat comprenant une pellicule protectrice placée sur une couche de photorésistance, le matériau de formation d'une pellicule protectrice étant formé d'une pellicule photorésistante, le matériau de formation d’une pellicule protectrice comprenant un polyéther de fluoroalkyle cyclique et un solvant fluoro-organique, ainsi qu’un procédé pour former un motif photorésistant utilisant ce matériau de formation d'une pellicule protectrice.
(JA)not available
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, KE, KG, KM, KN, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, LY, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)