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1. WO2006120987 - SURFACE MODIFYING METHOD AND DEVICE

Publication Number WO/2006/120987
Publication Date 16.11.2006
International Application No. PCT/JP2006/309207
International Filing Date 27.04.2006
IPC
C23C 4/18 2006.1
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
4Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
18After-treatment
CPC
C23C 4/18
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
4Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
18After-treatment
Applicants
  • 株式会社 荏原製作所 EBARA CORPORATION [JP]/[JP] (AllExceptUS)
  • 成田 貴行 NARITA, Takayuki [JP]/[JP] (UsOnly)
  • 長坂 浩志 NAGASAKA, Hiroshi [JP]/[JP] (UsOnly)
  • 小川 俊之 OGAWA, Toshiyuki [JP]/[JP] (UsOnly)
  • 杉山 憲一 SUGIYAMA, Kenichi [JP]/[JP] (UsOnly)
  • 川村 聡 KAWAMURA, Satoshi [JP]/[JP] (UsOnly)
  • 浅野 保夫 ASANO, Yasuo [JP]/[JP] (UsOnly)
Inventors
  • 成田 貴行 NARITA, Takayuki
  • 長坂 浩志 NAGASAKA, Hiroshi
  • 小川 俊之 OGAWA, Toshiyuki
  • 杉山 憲一 SUGIYAMA, Kenichi
  • 川村 聡 KAWAMURA, Satoshi
  • 浅野 保夫 ASANO, Yasuo
Agents
  • 渡邉 勇 WATANABE, Isamu
Priority Data
2005-14040112.05.2005JP
Publication Language Japanese (ja)
Filing Language Japanese (JA)
Designated States
Title
(EN) SURFACE MODIFYING METHOD AND DEVICE
(FR) PROCEDE ET DISPOSITIF DE MODIFICATION DE SURFACE
(JA) 表面改質方法及び装置
Abstract
(EN) A spraying film is formed on the surface of a base material (42), and the spraying film is high-frequency-induction-heated while a portion in the vicinity of the surface layer of the spraying film is kept non-fluidized to thereby re-melt a portion on the lower layer side of the vicinity of the surface layer and allow the spraying film to closely bond to the base material (42). This method can smoothly form a quality, wear-resisting film on the surface of a base material to thereby modify the surface of even a complicated-shape matter to be treated having an inclined portion.
(FR) L'invention concerne un film de pulvérisation qui est formé à la surface d'un matériau de base (42), et le film de pulvérisation est chauffé par induction à haute fréquence tandis qu'une partie à proximité de la couche superficielle du film de pulvérisation est maintenue dans un état non fluidifié, ce qui permet de fondre de nouveau une partie de la couche inférieure à proximité de la couche superficielle et de laisser le film de pulvérisation bien adhérer au matériau de base (42). Ce procédé peut servir à former, de manière régulière, un film de pulvérisation de qualité, résistant à l'usure sur la surface d'un matériau de base pour modifier ainsi la surface d'une matière, même de forme compliquée, à traiter qui comporte une partie inclinée.
(JA) 母材(42)の表面に溶射皮膜を形成し、該溶射皮膜の表層近傍を非流動状態に保ちながら該溶射皮膜を高周波誘導加熱することにより、表層近傍より下層側を再溶融させて該溶射皮膜を母材(42)に密着させる。この方法によれば、傾斜部分を有する複雑な形状の被処理物でも円滑に品質の良い耐摩耗性皮膜を母材の表面に形成して、表面を改質することができる。
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EP6746039This application is not viewable in PATENTSCOPE because the national phase entry has not been published yet or the national entry is issued from a country that does not share data with WIPO or there is a formatting issue or an unavailability of the application.
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