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1. WO2006120927 - OPTICAL ELEMENT DRIVING APPARATUS, PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD

Publication Number WO/2006/120927
Publication Date 16.11.2006
International Application No. PCT/JP2006/308899
International Filing Date 27.04.2006
IPC
H01L 21/027 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02Manufacture or treatment of semiconductor devices or of parts thereof
027Making masks on semiconductor bodies for further photolithographic processing, not provided for in group H01L21/18 or H01L21/34165
G02B 7/02 2006.01
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
7Mountings, adjusting means, or light-tight connections, for optical elements
02for lenses
G02B 13/24 2006.01
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
13Optical objectives specially designed for the purposes specified below
24for reproducing or copying at short object distances
G02B 17/00 2006.01
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
17Systems with reflecting surfaces, with or without refracting elements
CPC
G02B 17/06
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
17Systems with reflecting surfaces, with or without refracting elements
02Catoptric systems, e.g. image erecting and reversing system
06using mirrors only ; , i.e. having only one curved mirror
G02B 7/005
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
7Mountings, adjusting means, or light-tight connections, for optical elements
003Alignment of optical elements
005Motorised alignment
G02B 7/1827
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
7Mountings, adjusting means, or light-tight connections, for optical elements
18for prisms; for mirrors
182for mirrors
1822comprising means for aligning the optical axis
1827Motorised alignment
G03F 7/70266
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70216Systems for imaging mask onto workpiece
70258Projection system adjustment, alignment during assembly of projection system
70266Adaptive optics, e.g. deformable optical elements for wavefront control
G03F 7/70825
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
708Construction of apparatus, e.g. environment, hygiene aspects or materials
70808Construction details, e.g. housing, load-lock, seals, windows for passing light in- and out of apparatus
70825Mounting of individual elements, e.g. mounts, holders or supports
G03F 7/709
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
708Construction of apparatus, e.g. environment, hygiene aspects or materials
70858Environment aspects, e.g. pressure of beam-path gas, temperature
709Vibration, e.g. vibration detection, compensation, suppression
Applicants
  • 株式会社 ニコン NIKON CORPORATION [JP]/[JP] (AllExceptUS)
  • 石川 光男 ISHIKAWA, Mitsuo [JP]/[JP] (UsOnly)
Inventors
  • 石川 光男 ISHIKAWA, Mitsuo
Agents
  • 恩田 博宣 ONDA, Hironori
Priority Data
2005-13422502.05.2005JP
Publication Language Japanese (JA)
Filing Language Japanese (JA)
Designated States
Title
(EN) OPTICAL ELEMENT DRIVING APPARATUS, PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD
(FR) APPAREIL DE COMMANDE D’ELEMENT OPTIQUE, SYSTEME OPTIQUE DE PROJECTION, APPAREIL D’EXPOSITION ET PROCEDE DE FABRICATION DE DISPOSITIF
(JA) 光学要素駆動装置、投影光学系、露光装置、及びデバイスの製造方法
Abstract
(EN)
An outer ring (21) is arranged in a lens tube unit (14c). A driving mechanism (25) provided on the outer ring shifts an optical element (M), and adjusts the position and the posture of the optical element. A damper mechanism (31) for suppressing propagation of vibration to the optical element is attached to the outer ring.
(FR)
Selon l'invention, un anneau externe (21) est agencé dans une unité de tube de lentille (14c). Un mécanisme de commande (25) disposé sur l’anneau externe décale un élément optique (M) et règle la position et la posture de l’élément optique. Un mécanisme d’amortissement (31) pour supprimer la propagation de la vibration vers l’élément optique est fixé sur l’anneau externe.
(JA)
鏡筒ユニット(14c)内にアウタリング(21)が配置される。アウタリングに設けられた駆動機構(25)は光学要素(M)を移動して、光学要素の位置と姿勢を調整する。振動が光学要素に伝播するのを抑制するダンパ機構(31)はアウタリングに取り付けられている。
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