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Machine translation
1. (WO2006115783) METHOD AND APPARATUS FOR IMPROVED CURRENT FOCUSING IN GALVANIC RESISTIVITY MEASUREMENT TOOLS
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2006/115783    International Application No.:    PCT/US2006/013653
Publication Date: 02.11.2006 International Filing Date: 11.04.2006
Chapter 2 Demand Filed:    09.02.2007    
IPC:
G01V 3/20 (2006.01)
Applicants: BAKER HUGHES INCORPORATED [US/US]; 3900 Essex Lane, Suite 1200, Houston, TX 77027 (US) (For All Designated States Except US)
Inventors: GOREK, Mathias; (DE).
FOLBERTH, Martin; (DE).
FULDA, Christian; (DE)
Agent: RIDDLE, J., Albert; Baker Hughes Incorporated, P.O. Box 4740, Houston, Texas 77210-4740 (US)
Priority Data:
11/110,620 20.04.2005 US
Title (EN) METHOD AND APPARATUS FOR IMPROVED CURRENT FOCUSING IN GALVANIC RESISTIVITY MEASUREMENT TOOLS
(FR) PROCEDE ET APPAREIL PERMETTANT UNE CONCENTRATION DE COURANT AMELIOREE DANS LES OUTILS DE MESURE DE LA RESISTANCE GALVANIQUE
Abstract: front page image
(EN)A galvanic resistivity tool with one or more measurement electrodes and guard electrodes, and one or more shielding electrodes. The potential difference between the measurement electrodes and the guard electrodes is controlled to minimize current flow between the measurement electrodes and the shielding electrodes. This provides improved focusing and avoids effects of contact impedance.
(FR)L'invention concerne un outil à résistance galvanique qui comprend une ou plusieurs électrodes de mesure et électrodes de garde, et une ou plusieurs électrodes de blindage. La différence de potentiel entre les électrodes de mesure et les électrodes de garde est régulée de manière à minimiser le flux de courant entre les électrodes de mesure et les électrodes de blindage, ce qui permet d'améliorer la concentration et d'éviter les effets de l'impédance de contact.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, LY, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)