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1. (WO2006113492) ADJUSTABLE SOLUBILITY IN SACRIFICIAL LAYERS FOR MICROFABRICATION
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2006/113492 International Application No.: PCT/US2006/014184
Publication Date: 26.10.2006 International Filing Date: 14.04.2006
Chapter 2 Demand Filed: 14.02.2007
IPC:
G03F 7/00 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Applicants:
PRESIDENT AND FELLOWS OF HARVARD COLLEGE [US/US]; 17 Quincy Street Cambridge, Massachusetts 02138, US (AllExceptUS)
LINDER, Vincent [CH/US]; CH (UsOnly)
GATES, Byron [CA/CA]; CA (UsOnly)
RYAN, Declan [US/US]; US (UsOnly)
AMIRPARVIZ, Babak [US/US]; US (UsOnly)
WHITESIDES, George, M. [US/US]; US (UsOnly)
Inventors:
LINDER, Vincent; CH
GATES, Byron; CA
RYAN, Declan; US
AMIRPARVIZ, Babak; US
WHITESIDES, George, M.; US
Agent:
OYER, Timothy, J.; WOLF, GREENFIELD & SACKS, P.C. 600 Atlantic Avenue Boston, Massachusetts 02210, US
Priority Data:
60/671,41514.04.2005US
Title (EN) ADJUSTABLE SOLUBILITY IN SACRIFICIAL LAYERS FOR MICROFABRICATION
(FR) SOLUBILITE AJUSTABLE DANS DES COUCHES SACRIFICIELLES POUR MICROFABRICATION
Abstract:
(EN) The present invention provides fabrication methods using sacrificial materials comprising polymers. In some embodiments, the polymer may be treated to alter its solubility with respect to at least one solvent (e.g., aqueous solution) used in the fabrication process. The preparation of the sacrificial materials is rapid and simple, and dissolution of the sacrificial material can be carried out in mild environments. Sacrificial materials of the present invention may be useful for surface micromachining, bulk micromachining, and other microfabrication processes in which a sacrificial layer is employed for producing a selected and corresponding physical structure.
(FR) L'invention concerne des procédés de fabrication utilisant des matériaux sacrificiels comprenant des polymères. Dans certaines formes d'exécution, le polymère peut être traité pour altérer sa solubilité par rapport à au moins un solvant (par exemple, une solution aqueuse) utilisé dans le procédé de fabrication. La préparation des matériaux sacrificiels est rapide et simple, et la dissolution du matériau sacrificiel peut être effectuée dans des environnements modérés. Les matériaux sacrificiels de la présente invention peuvent être utilisés pour le micro-usinage des surfaces, le micro-usinage en volume, et autres procédés de microfabrication dans lesquels une couche sacrificielle est employée pour produire une structure sélectionnée et physiquement correspondante.
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Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, LY, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)