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1. WO2006101120 - EXPOSURE APPARATUS, EXPOSURE METHOD AND METHOD FOR MANUFACTURING DEVICE

Publication Number WO/2006/101120
Publication Date 28.09.2006
International Application No. PCT/JP2006/305695
International Filing Date 22.03.2006
IPC
H01L 21/027 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02Manufacture or treatment of semiconductor devices or of parts thereof
027Making masks on semiconductor bodies for further photolithographic processing, not provided for in group H01L21/18 or H01L21/34165
G03F 7/20 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
CPC
G03F 7/70341
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70216Systems for imaging mask onto workpiece
70341Immersion
G03F 7/70875
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
708Construction of apparatus, e.g. environment, hygiene aspects or materials
70858Environment aspects, e.g. pressure of beam-path gas, temperature
70866of mask or workpiece
70875Temperature
Applicants
  • 株式会社ニコン NIKON CORPORATION [JP]/[JP] (AllExceptUS)
  • 木内 徹 KIUCHI, Tohru [JP]/[JP] (UsOnly)
Inventors
  • 木内 徹 KIUCHI, Tohru
Agents
  • 志賀 正武 SHIGA, Masatake
Priority Data
2005-08375623.03.2005JP
Publication Language Japanese (JA)
Filing Language Japanese (JA)
Designated States
Title
(EN) EXPOSURE APPARATUS, EXPOSURE METHOD AND METHOD FOR MANUFACTURING DEVICE
(FR) APPAREIL D'EXPOSITION, PROCEDE D'EXPOSITION ET PROCEDE DE FABRICATION DU DISPOSITIF
(JA) 露光装置及び露光方法、並びにデバイス製造方法
Abstract
(EN)
Disclosed is an exposure apparatus comprising a gas sealing mechanism (3) for generating an air flow on a substrate (P) and sealing a liquid (LQ) filling the light path of exposure light, and a compensation mechanism (5) for compensating a temperature change in the substrate (P) which is caused by the air flow generated by the gas sealing mechanism (3).
(FR)
L'invention concerne un appareil d'exposition comportant un mécanisme d'étanchéité à gaz (3) pour créer un flux d'air sur un substrat (P) et assurer l'étanchéité d'un liquide (LQ) remplissant le trajet lumineux de la lumière d'exposition, et un mécanisme de compensation (5) pour compenser un changement de température dans le substrat (P) causé par le flux d'air créé par le mécanisme d'étanchéité à gaz(3).
(JA)
 露光装置は、基板(P)上に気流を生成しかつ露光光の光路空間に満たされた液体(LQ)をシールするガスシール機構(3)と、ガスシール機構(3)により生成された気流に起因する基板(P)の温度変化を補償する補償機構(5)とを備えている。
Also published as
EP6729662
Latest bibliographic data on file with the International Bureau