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1. WO2006100825 - PHOTOCURABLE RESIN COMPOSITION FOR FORMING BLACK MATRIX, PHOTOSENSITIVE FILM USING THE SAME, METHOD FOR FORMING BLACK MATRIX, BLACK MATRIX AND PLASMA DISPLAY PANEL HAVING THE BLACK MATRIX

Publication Number WO/2006/100825
Publication Date 28.09.2006
International Application No. PCT/JP2006/301149
International Filing Date 25.01.2006
IPC
G03F 7/004 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
G03F 7/032 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
032with binders
G02B 5/20 2006.01
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
5Optical elements other than lenses
20Filters
G03F 7/40 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
26Processing photosensitive materials; Apparatus therefor
40Treatment after imagewise removal, e.g. baking
CPC
C08F 2/48
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
2Processes of polymerisation
46Polymerisation initiated by wave energy or particle radiation
48by ultra-violet or visible light
G03F 7/0007
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
0007Filters, e.g. additive colour filters; Components for display devices
G03F 7/0047
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
0047characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
Applicants
  • 東京応化工業株式会社 TOKYO OHKA KOGYO CO., LTD. [JP]/[JP] (AllExceptUS)
  • 押尾 公徳 OSHIO, Kiminori [JP]/[JP] (UsOnly)
  • 熊澤 明 KUMAZAWA, Akira [JP]/[JP] (UsOnly)
  • 水澤 竜馬 MIZUSAWA, Ryuma [JP]/[JP] (UsOnly)
  • 節田 斉 SETSUDA, Hitoshi [JP]/[JP] (UsOnly)
  • 帯谷 洋之 OBIYA, Hiroyuki [JP]/[JP] (UsOnly)
Inventors
  • 押尾 公徳 OSHIO, Kiminori
  • 熊澤 明 KUMAZAWA, Akira
  • 水澤 竜馬 MIZUSAWA, Ryuma
  • 節田 斉 SETSUDA, Hitoshi
  • 帯谷 洋之 OBIYA, Hiroyuki
Agents
  • 正林 真之 SHOBAYASHI, Masayuki
Priority Data
2005-07844418.03.2005JP
Publication Language Japanese (JA)
Filing Language Japanese (JA)
Designated States
Title
(EN) PHOTOCURABLE RESIN COMPOSITION FOR FORMING BLACK MATRIX, PHOTOSENSITIVE FILM USING THE SAME, METHOD FOR FORMING BLACK MATRIX, BLACK MATRIX AND PLASMA DISPLAY PANEL HAVING THE BLACK MATRIX
(FR) COMPOSITION DE RÉSINE PHOTOVULCANISABLE POUR FORMER UNE MATRICE NOIRE, FILM PHOTOSENSIBLE UTILISANT LADITE COMPOSITION, PROCÉDÉ DE FORMATION DE MATRICE NOIRE, MATRICE NOIRE ET PANNEAU D’AFFICHAGE PLASMA AYANT LA MATRICE NOIRE
(JA) ブラックマトリックス形成用光硬化性樹脂組成物、これを用いた感光性フィルム、ブラックマトリックスの形成方法、ブラックマトリックス及びそのブラックマトリックスを有するプラズマディスプレイパネル
Abstract
(EN)
Provided is a photocurable resin composition which can perform fine patterning and can form a black matrix exhibiting a satisfactory black color, and further can be developed with water. The above photocurable resin composition comprises (A) a powder of a metal having an ionic valence number of 2 or greater which is converted to a black material by oxidation, and (B) an organic component comprising (i) a water-soluble cellulose derivative, (ii) a photo-polymerizable monomer, (iii) an acrylic resin having a hydroxy group and (iv) a photopolymerization initiator. The above metals having an ionic valence number of 2 or greater include at least one selected from the group consisting of copper, iron and cobalt.
(FR)
L’invention concerne une composition de résine photovulcanisable susceptible de réaliser de fins motifs et de constituer une matrice noire présentant une couleur noire satisfaisante et que l’on peut développer avec de l’eau. La composition de résine photovulcanisable ci-dessus comprend (A) une poudre de métal ayant un nombre de valence ionique supérieur ou égal à 2 que l’on convertit en matériau noir par oxydation, et (B) un composant organique comprenant (i) un dérivé de cellulose soluble dans l’eau, (ii) un monomère photopolymérisable, (iii) une résine acrylique ayant un groupe hydroxy et (iv) un initiateur de photopolymérisation. Les métaux ci-dessus ayant un nombre de valence ionique supérieur ou égal à 2 incluent au moins un élément sélectionné dans le groupe consistant en cuivre, fer et cobalt.
(JA)
 微細なパターニングをすることが可能で、かつ十分な黒色を有するブラックマトリックスを形成できる、水現像可能な光硬化性樹脂組成物を提供する。光硬化性樹脂組成物の構成成分として、(A)酸化により黒色化するイオン価数が2以上の金属の粉末と、(B)(i)水溶性セルロース誘導体と、(ii)光重合性単量体と、(iii)ヒドロキシ基を有するアクリル系樹脂と、(iv)光重合開始剤とからなる有機成分とを含有させる。前記(A)酸化により黒色化するイオン価数が2以上の金属としては、銅、鉄、コバルトからなる群から選ばれる少なくとも1つが挙げられる。
Also published as
EP6712344
Latest bibliographic data on file with the International Bureau