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1. WO2006095478 - PHOTOSENSITIVE RESIN COMPOSITION AND COLOR FILTERS

Publication Number WO/2006/095478
Publication Date 14.09.2006
International Application No. PCT/JP2005/022196
International Filing Date 02.12.2005
IPC
G03F 7/023 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
022Quinonediazides
023Macromolecular quinonediazides; Macromolecular additives, e.g. binders
G02B 5/20 2006.01
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
5Optical elements other than lenses
20Filters
G03F 7/004 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
CPC
G02B 5/223
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
5Optical elements other than lenses
20Filters
22Absorbing filters
223containing organic substances, e.g. dyes, inks or pigments
G03F 7/0007
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
0007Filters, e.g. additive colour filters; Components for display devices
G03F 7/0233
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
022Quinonediazides
023Macromolecular quinonediazides; Macromolecular additives, e.g. binders
0233characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
Applicants
  • 東京応化工業株式会社 TOKYO OHKA KOGYO CO., LTD. [JP]/[JP] (AllExceptUS)
  • 大西 啓之 OHNISHI, Hiroyuki [JP]/[JP] (UsOnly)
  • 杉本 安章 SUGIMOTO, Yasuaki [JP]/[JP] (UsOnly)
Inventors
  • 大西 啓之 OHNISHI, Hiroyuki
  • 杉本 安章 SUGIMOTO, Yasuaki
Agents
  • 棚井 澄雄 TANAI, Sumio
Priority Data
2005-06680610.03.2005JP
Publication Language Japanese (JA)
Filing Language Japanese (JA)
Designated States
Title
(EN) PHOTOSENSITIVE RESIN COMPOSITION AND COLOR FILTERS
(FR) COMPOSITION DE RÉSINE PHOTOSENSIBLE ET FILTRES COLORÉS
(JA) 感光性樹脂組成物およびカラーフィルタ
Abstract
(EN)
A positive type photosensitive resin composition having good heat resistance, namely, a photosensitive resin composition which comprises an alkali-soluble resin component (A) and a photosensitizer (B), characterized in that the component (A) contains a resin component (A1) comprising structural units (a1) represented by the general formula (a1): (a1) wherein R0 is hydrogen or methyl; R1 is a single bond or alkylene having 1 to 5 carbon atoms; R2 is alkyl having 1 to 5 carbon atoms; a is an integer of 1 to 5 and b is an integer of 0 to 4, with the proviso that the sum of a and b is 5 or below; and when two or more R2's are present, the R2's may be the same or different from each other.
(FR)
Composition de résine photosensible de type positif ayant une bonne résistance à la chaleur, à savoir composition de résine photosensible qui comprend un composant résine soluble dans un alcali (A) et un photosensibilisateur (B), caractérisée en ce que le composant (A) contient un composant résine (A1) comprenant des unités de structure (a1) représentées par la formule générale (a1): (a1) dans laquelle R0 est un hydrogène ou un méthyle ; R1 est une simple liaison ou un alkylène ayant 1 à 5 atomes de carbone ; R2 est un alkyle ayant 1 à 5 atomes de carbone ; a est un nombre entier de 1 à 5 et b est un nombre entier de 0 à 4, à condition que la somme de a et b soit inférieure ou égale à 5 ; et que lorsque deux ou plus de deux R2 sont présents, les R2 puissent être identiques ou différents les uns des autres.
(JA)
not available
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