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1. WO2006094647 - MEASURING ARRANGEMENT FOR THE OPTICAL MONITORING OF COATING PROCESSES

Publication Number WO/2006/094647
Publication Date 14.09.2006
International Application No. PCT/EP2006/001667
International Filing Date 23.02.2006
Chapter 2 Demand Filed 12.06.2006
IPC
G01B 11/06 2006.01
GPHYSICS
01MEASURING; TESTING
BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
11Measuring arrangements characterised by the use of optical means
02for measuring length, width, or thickness
06for measuring thickness
C23C 14/54 2006.01
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22characterised by the process of coating
54Controlling or regulating the coating process
CPC
C23C 14/547
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22characterised by the process of coating
54Controlling or regulating the coating process
542Controlling the film thickness or evaporation rate
545using measurement on deposited material
547using optical methods
G01B 11/0683
GPHYSICS
01MEASURING; TESTING
BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
11Measuring arrangements characterised by the use of optical means
02for measuring length, width or thickness
06for measuring thickness, e.g. of sheet material
0616of coating
0683measurement during deposition or removal of the layer
Applicants
  • LEYBOLD OPTICS GMBH [DE]/[DE] (AllExceptUS)
  • ZÖLLER, Alfons [DE]/[DE] (UsOnly)
  • HAGEDORN, Harro [DE]/[DE] (UsOnly)
  • KLUG, Werner [DE]/[DE] (UsOnly)
Inventors
  • ZÖLLER, Alfons
  • HAGEDORN, Harro
  • KLUG, Werner
Agents
  • POHLMANN, Bernd, Michael
Priority Data
10 2005 010 681.109.03.2005DE
Publication Language German (DE)
Filing Language German (DE)
Designated States
Title
(DE) MESSANORDNUNG ZUM OPTISCHEN MONITORING VON BESCHICHTUNGSPROZESSEN
(EN) MEASURING ARRANGEMENT FOR THE OPTICAL MONITORING OF COATING PROCESSES
(FR) DISPOSITIF DE MESURE POUR UN CONTROLE OPTIQUE DE PROCESSUS DE REVETEMENT
Abstract
(DE)
Die Erfindung betrifft eine Messanordnung zum optischen Monitoring von Beschichtungsprozessen in einer Vakuumkammer, bei welcher die Lichtquelle innerhalb der Vakuumkammer zwischen dem Substrathalter und einer unterhalb des Substrathalters angeordneten Blende angeordnet ist und die Lichtempfängereinheit außerhalb der Vakuumkammer im Strahlengang der Lichtquelle angeordneten ist. Der Substrathalter ist zur Aufnahme von zumindest einem Substrat ausgelegt und kann sich in der Vakuumkammer über einer Beschichtungsquelle bewegen, vorzugsweise um eine Achse rotieren, wobei das Substrat oder die Substrate den Strahlengang zwischen der Lichtquelle und der Lichtempfängereinheit zur Transmissionsmessung kreuzen und die Blende einen Messbereich über der Beschichtungsquelle abschattet.
(EN)
The invention relates to a measuring arrangement for the optical monitoring of coating processes in a vacuum chamber. According to said method, the light source is arranged inside the vacuum chamber, between the substrate holder and a diaphragm arranged beneath the substrate holder, and the light receiving unit is arranged outside the vacuum chamber, in the beam path of the light source. Said substrate holder is embodied in such a way as to receive at least one substrate and can be displaced in the vacuum chamber over a coating source, preferably rotated about an axis. The substrate or substrates cross the beam path between the light source and the light receiving unit for transmission measurement purposes, and the diaphragm covers a measuring region over the coating source.
(FR)
La présente invention concerne un dispositif de mesure pour un contrôle optique de processus de revêtement dans une chambre sous vide. La source lumineuse se trouve à l'intérieur de la chambre sous vide, entre le support à substrat et un diaphragme placé en-dessous du support à substrat. L'unité de réception de lumière se trouve à l'extérieur de la chambre sous vide, sur la trajectoire des rayons de la source lumineuse. Le support à substrat est conçu pour recevoir au moins un substrat et peut se déplacer, de préférence tourner autour d'un axe, dans la chambre sous vide au-dessus d'une source de revêtement. Le ou les substrats croisent la trajectoire des rayons entre la source lumineuse et l'unité de réception de lumière à des fins de mesure de transmission et le diaphragme couvre une zone de mesure au-dessus de la source de revêtement.
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