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1. WO2006093643 - HORIZONTAL EMITTING, VERTICAL EMITTING, BEAM SHAPED, DISTRIBUTED FEEDBACK (DFB) LASERS BY GROWTH OVER A PATTERNED SUBSTRATE

Publication Number WO/2006/093643
Publication Date 08.09.2006
International Application No. PCT/US2006/004499
International Filing Date 09.02.2006
IPC
H01L 21/00 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
CPC
H01S 2304/12
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
2304Special growth methods for semiconductor lasers
12Pendeo epitaxial lateral overgrowth [ELOG], e.g. for growing GaN based blue laser diodes
H01S 5/1021
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
5Semiconductor lasers
10Construction or shape of the optical resonator ; , e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
1021Coupled cavities
H01S 5/105
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
5Semiconductor lasers
10Construction or shape of the optical resonator ; , e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
105Comprising a photonic bandgap structure
H01S 5/12
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
5Semiconductor lasers
10Construction or shape of the optical resonator ; , e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
12the resonator having a periodic structure, e.g. in distributed feed-back [DFB] lasers
H01S 5/187
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
5Semiconductor lasers
10Construction or shape of the optical resonator ; , e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
18Surface-emitting [SE] lasers
187using a distributed Bragg reflector [SE-DBR-lasers]
H01S 5/32341
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
5Semiconductor lasers
30Structure or shape of the active region; Materials used for the active region
32comprising PN junctions, e.g. hetero- or double- heterostructures
323in AIIIBV compounds, e.g. AlGaAs-laser, ; InP-based laser
32308emitting light at a wavelength less than 900 nm
32341blue laser based on GaN or GaP
Applicants
  • THE REGENTS OF THE UNIVERSITY OF CALIFORNIA [US]/[US] (AllExceptUS)
  • WEISBUCH, Claude, C. A. [FR]/[FR] (UsOnly)
  • DAVID, Aurelien, J. F. [FR]/[FR] (UsOnly)
  • SPECK, James, S. [US]/[US] (UsOnly)
  • DENBAARS, Steven, P. [US]/[US] (UsOnly)
Inventors
  • WEISBUCH, Claude, C. A.
  • DAVID, Aurelien, J. F.
  • SPECK, James, S.
  • DENBAARS, Steven, P.
Agents
  • GATES, George, H.
Priority Data
11/067,95728.02.2005US
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) HORIZONTAL EMITTING, VERTICAL EMITTING, BEAM SHAPED, DISTRIBUTED FEEDBACK (DFB) LASERS BY GROWTH OVER A PATTERNED SUBSTRATE
(FR) LASERS A RETROACTION REPARTIE (DFB) EN FORME DE FAISCEAU A EMISSION HORIZONTALE ET VERTICALE PAR CROISSANCE SUR UN SUBSTRAT A MOTIFS
Abstract
(EN)
A structure using integrated optical elements is comprised of a substrate, a buffer layer grown on the substrate, one or more patterned layers formed on the buffer layer and one or more active layers formed on or between the patterned layers, for instance by Lateral Epitaxial Overgrowth (LEO), and including one or more light emitting species. The patterned layer comprises a mask (made of insulating, semiconducting or metallic material) and material filling holes in the mask. The patterned layer, due to a large index difference with the active layer and/or variations of a refractive index between the mask and materials filling holes in the mask, acts as an optical confinement layer, a mirror, a diffraction grating, a wavelength selective element, a beam shaping element or a beam directing element.
(FR)
La présente invention a trait à une structure utilisant des éléments optiques intégrés et qui comprend un substrat, une couche tampon développée sur le substrat, une ou plusieurs couches à motifs formées sur la couche tampon et une ou plusieurs couches actives formées sur ou entre les couches à motif, par exemple par croissance épitaxiale latérale (LEO), et comprenant une ou plusieurs espèces électroluminescentes. La couche à motifs comprend un masque (constitué d'un matériau isolant, semi-conducteur ou métallique) et d'orifices de remplissage du matériau dans le masque. La couche à motifs, due à la grande différence d'indice avec la couche active et/ou aux variations d'un indice de réfraction entre le masque et les orifices de remplissage de matériau dans le masque, agit comme une couche de confinement optique, un miroir, un réseau de diffraction, un élément sélectif de longueur d'ondes, un élément de formation de faisceau et un élément de direction de faisceau.
Also published as
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