WIPO logo
Mobile | Deutsch | Español | Français | 日本語 | 한국어 | Português | Русский | 中文 | العربية |
PATENTSCOPE

Search International and National Patent Collections
World Intellectual Property Organization
Search
 
Browse
 
Translate
 
Options
 
News
 
Login
 
Help
 
Machine translation
1. (WO2006091909) ETCHING AND CLEANING BPSG MATERIAL USING SUPERCRITICAL PROCESSING
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2006/091909    International Application No.:    PCT/US2006/006768
Publication Date: 31.08.2006 International Filing Date: 22.02.2006
IPC:
B44C 1/22 (2006.01), C03C 15/00 (2006.01)
Applicants: SUPERCRITICAL SYSTEMS INC. [US/US]; 4350 W. Chandler Blvd., Suite 10, Chandler, Arizona 85226 (US) (For All Designated States Except US).
JACOBSON, Gunilla [SE/US]; (US) (For US Only).
KEVWITCH, Robert [US/US]; (US) (For US Only).
LOWE, Marie [US/US]; (US) (For US Only)
Inventors: JACOBSON, Gunilla; (US).
KEVWITCH, Robert; (US).
LOWE, Marie; (US)
Agent: HAVERSTOCK, Thomas, B.; HAVERSTOCK & OWENS LLP, 162 North Wolfe Road, Sunnyvale, California 94086 (US)
Priority Data:
11/065,376 23.02.2005 US
11/065,377 23.02.2005 US
11/065,636 23.02.2005 US
Title (EN) ETCHING AND CLEANING BPSG MATERIAL USING SUPERCRITICAL PROCESSING
(FR) GRAVURE ET NETTOYAGE DE MATERIAU DE VERRE DE BOROPHOSPHOSILICATE A L'AIDE D'UN TRAITEMENT SUPERCRITIQUE
Abstract: front page image
(EN)A method for etching and removing post-etch residue from a BPSG material is disclosed. In accordance with the method of the present invention, the BPSG material is etched and the residue is removed from the substrate structure using supercritical solutions.
(FR)L'invention concerne un procédé permettant de graver et d'éliminer un résidu post-gravure d'un matériau de borophosphosilicate (BPSG). Selon le procédé de l'invention, le matériau BPSG est gravé et le résidu est éliminé de la structure du substrat à l'aide de solutions supercritiques.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, LY, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)