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Machine translation
1. (WO2006090747) MASK HOLDING MECHANISM AND FILM FORMING APPARATUS
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2006/090747    International Application No.:    PCT/JP2006/303189
Publication Date: 31.08.2006 International Filing Date: 22.02.2006
IPC:
C23C 14/24 (2006.01), C23C 14/04 (2006.01), C23C 14/12 (2006.01), C23C 14/50 (2006.01), C23C 14/56 (2006.01), H01L 51/50 (2006.01), H05B 33/10 (2006.01)
Applicants: MITSUI ENGINEERING & SHIPBUILDING CO., LTD. [JP/JP]; 6-4, Tsukiji 5-chome, Chuo-ku, Tokyo 1048439 (JP) (For All Designated States Except US).
Vieetech Japan Co., Ltd. [JP/JP] (For All Designated States Except US).
CHOSHU INDUSTRY COMPANY LIMITED [JP/JP] (For All Designated States Except US).
KATAOKA, Tatsuya [JP/JP]; (For US Only).
NAGAO, Kenji [JP/JP]; (For US Only).
SAITO, Kenichi [JP/JP]; (For US Only)
Inventors: KATAOKA, Tatsuya; .
NAGAO, Kenji; .
SAITO, Kenichi;
Agent: MURAKAMI, Tomokazu; 4th floor, Tsubaki Bldg. 10-2, Nishi-Ikebukuro 5-chome Toshima-ku, Tokyo 1710021 (JP)
Priority Data:
2005-047813 23.02.2005 JP
Title (EN) MASK HOLDING MECHANISM AND FILM FORMING APPARATUS
(FR) MÉCANISME DE MAINTIEN DE MASQUE ET APPAREIL DE FORMATION DE FILM
(JA) マスク保持機構および成膜装置
Abstract: front page image
(EN)A mask holding mechanism is provided for a mask (24) which covers a substrate mounted and held on a chuck (14) of a film forming apparatus. The mask (24) is formed of a magnetic material, and an opposite side of the chuck (14) to the chuck plane which holds the substrate is dotted with magnets (16). The magnets (16) may be arranged at lattice points forming a lattice.
(FR)L'invention concerne un mécanisme de maintien de masque disposé sur un masque (24) qui recouvre un substrat monté et maintenu sur un mandrin (14) d'un appareil de formation de film. Le masque (24) est constitué d'un matériau magnétique, et un côté du mandrin (14) opposé au plan de mandrin qui maintient le substrat est piqué d'aimants (16). Les aimants (16) peuvent être disposés en points de treillis formant un treillis.
(JA) マスク保持機構は、成膜装置のチャック14に装着保持されている基板に被せられるマスク24のマスク保持機構であって、前記マスク24は、磁性体で形成されてなり、前記チャック14の前記基板を保持するチャック面と反対側に、磁石16を点状に配設した構成である。そして前記磁石16は、格子を形成する格子点に配設された構成にすることができる。
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, KE, KG, KM, KN, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, LY, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)