WIPO logo
Mobile | Deutsch | Español | Français | 日本語 | 한국어 | Português | Русский | 中文 | العربية |

Search International and National Patent Collections
World Intellectual Property Organization
Machine translation
1. (WO2006090529) RESIN REMOVER
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2006/090529    International Application No.:    PCT/JP2006/300118
Publication Date: 31.08.2006 International Filing Date: 10.01.2006
C11D 7/26 (2006.01), B08B 3/08 (2006.01), C09D 9/00 (2006.01)
Applicants: ADEKA CORPORATION [JP/JP]; 2-35, Higashiogu 7-chome, Arakawa-ku, Tokyo 1168554 (JP) (For All Designated States Except US).
TOKUHASHI, Takashi [JP/JP]; (JP) (For US Only).
IWAKURA, Syuji [JP/JP]; (JP) (For US Only)
Inventors: TOKUHASHI, Takashi; (JP).
IWAKURA, Syuji; (JP)
Agent: HATORI, Osamu; Akasaka HKN BLDG. 6F, 8-6, Akasaka 1-chome, Minato-ku, Tokyo 1070052 (JP)
Priority Data:
2005-048299 24.02.2005 JP
(JA) 樹脂用除去剤
Abstract: front page image
(EN)Disclosed is a remover for removing or cleaning a resin or resin composition from a solid surface. The remover contains 1-100 parts by mass of an epoxy compound represented by the general formula (I) below per 100 parts by mass of one or more organic solvents. (In the formula, R represents a hydrocarbon group having 1-18 carbon atoms; R1-R8 independently represent a hydrogen atom or a methyl group; p represents 0 or 1; and m and n independently represent 0, 1 or 2.)
(FR)La présente invention concerne un dissolvant destiné à éliminer ou nettoyer de la résine ou une composition de résine présente sur une surface solide. Le dissolvant contient de 1 à 100 parties en masse d’un composé époxy représenté par la formule générale (I) ci-dessous pour 100 parties en masse d’un ou plusieurs solvants organiques. (I) (Dans la formule, R représente un groupe hydrocarboné ayant de 1 à 18 atomes de carbone, R1 à R8 représentent indépendamment un atome d’hydrogène ou un groupe méthyle ; p vaut 0 ou 1 ; et m et n valent indépendamment 0, 1 ou 2.)
(JA)not available
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, KE, KG, KM, KN, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, LY, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)