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Machine translation
1. (WO2006086815) CHARGED-PARTICLE EXPOSURE APPARATUS
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2006/086815    International Application No.:    PCT/AT2006/000060
Publication Date: 24.08.2006 International Filing Date: 16.02.2006
IPC:
H01J 37/317 (2006.01)
Applicants: IMS NANOFABRICATION AG [AT/AT]; Schreygasse 3, A-1020 Wien (AT) (For All Designated States Except US).
PLATZGUMMER, Elmar [AT/AT]; (AT) (For US Only).
CERNUSCA, Stefan [AT/AT]; (AT) (For US Only).
STENGL, Gerhard [DE/AT]; (AT) (For US Only)
Inventors: PLATZGUMMER, Elmar; (AT).
CERNUSCA, Stefan; (AT).
STENGL, Gerhard; (AT)
Agent: MATSCHNIG, Franz; Siebensterngasse 54, A-1071 Wien (AT)
Priority Data:
A 273/2005 18.02.2005 AT
Title (EN) CHARGED-PARTICLE EXPOSURE APPARATUS
(FR) DISPOSITIF D'EXPOSITION A PARTICULES CHARGEES
Abstract: front page image
(EN)A particle-beam projection processing apparatus (100) for irradiating a target (41), with an illumination system (101) for forming a wide-area illuminating beam (Ip) of energetic electrically charged particles; a pattern definition means (102) for positioning an aperture pattern (21) in the path of the illuminating beam; and a projection system (103) for projecting the beam thus patterned (pb) onto a target (41) to be positioned after the projection system. A foil (34, 35) located across the path of the patterned beam (pb) is positioned between the pattern definition means (102) and the position of the target (41) at a location close to an image (i0) of the aperture pattern (21) formed by the projection system.
(FR)Dispositif de traitement par projection de particules (100) pour l'irradiation de cible (41), avec système d'éclairage (101) formant un faisceau d'éclairage large zone (Ip) de particules à charge électrique; système de définition de modèle (102) permettant de placer un modèle d'ouverture (21) sur le trajet du faisceau ; et système de projection (103) du faisceau ainsi modelé (pb) sur la cible (41) destiné à être placé après le système de projection. Une feuille (34, 35) traversant le trajet de ce faisceau modelé (pb) est placée entre le système de définition de modèle (102) et l'emplacement de la cible (41) en un point proche d'une image (i0) du modèle d'ouverture (21) formé par le système de projection.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, LY, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)