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Machine translation
1. (WO2006086319) SPUTTERING TARGET AND METHOD OF FABRICATION
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2006/086319    International Application No.:    PCT/US2006/004143
Publication Date: 17.08.2006 International Filing Date: 07.02.2006
IPC:
B21B 1/02 (2006.01), B21B 1/38 (2006.01), C23C 14/34 (2006.01)
Applicants: CABOT CORPORATION [US/US]; TWO SEAPORT LANE, Suite 1300, Boston, MA 02210-2019 (US) (For All Designated States Except US).
WICKERSHAM, Charles, E., Jr. [US/US]; (US) (For US Only).
LEVIT, Vladimir, I. [US/US]; (US) (For US Only).
ALEXANDER, P., Todd [US/US]; (US) (For US Only)
Inventors: WICKERSHAM, Charles, E., Jr.; (US).
LEVIT, Vladimir, I.; (US).
ALEXANDER, P., Todd; (US)
Agent: FOLLETT, Robert, J.; CABOT CORPORATION, 157 Concord Road, Billerica, MA 01821-7001 (US)
Priority Data:
11/055,535 10.02.2005 US
Title (EN) SPUTTERING TARGET AND METHOD OF FABRICATION
(FR) CIBLE DE PULVERISATION ET SON PROCEDE DE FABRICATION
Abstract: front page image
(EN)A process is described for processing metal which includes clock rolling a metal plate until the desired thickness is achieved to form a rolled plate. Sputtering targets and other metal articles are further described.
(FR)La présente invention se rapporte à un procédé de traitement de métaux, qui consiste à procéder au laminage à rotation d'une plaque de métal jusqu'à ce que l'épaisseur désirée soit atteinte, afin de former une plaque laminée. L'invention concerne également des cibles de pulvérisation et d'autres articles métalliques.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, LY, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)