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Pub. No.:    WO/2006/085977    International Application No.:    PCT/US2005/023924
Publication Date: 17.08.2006 International Filing Date: 06.07.2005
G02B 1/11 (2006.01)
Applicants: HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. [US/US]; HEWLETT-PACKARD COMPANY, Intellectual Property Administration, 20555 S.H. 249, Houston, Texas 77070 (US) (For All Designated States Except US).
PIEHL, Arthur [US/US]; (US) (For US Only).
RAMAMOORTHI, Sriram [IN/US]; (US) (For US Only).
GARDNER, Daniel C. [US/US]; (US) (For US Only)
Inventors: PIEHL, Arthur; (US).
GARDNER, Daniel C.; (US)
Agent: MYERS, Timothy F.; HEWLETT-PACKARD COMPANY, Intellectual Property Administration, P.O. Box 272400, Mail Stop 35, Fort Collins, Colorado 80527-2400 (US)
Priority Data:
10/898,973 27.07.2004 US
Abstract: front page image
(EN)An antireflection surface formed using a plurality of nanostructures of a first material on a surface of a second material. The first material is different from the second material. The distribution of spacial periods of the nanostructures is set by a self-assembly operation. The surface of the second material is converted to operate as a graded index surface that is substantially antireflective for the wavelength of interest.
(FR)Surface antireflet formée à l'aide d'une pluralité de nanostructures d'une première matière déposée sur une surface d'une seconde matière. La première matière est différente de la seconde matière. La répartition des périodes spatiales des nanostructures est fixée par une opération d'auto-assemblage. La surface de la seconde matière est convertie de manière à fonctionner en tant que surface à gradient d'indice qui est pratiquement antireflet pour la longueur d'onde concernée.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)