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1. (WO2006085676) PROCESS AND APPARATUS FOR PRODUCING POROUS QUARTZ GLASS BASE
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2006/085676    International Application No.:    PCT/JP2006/302595
Publication Date: 17.08.2006 International Filing Date: 08.02.2006
IPC:
C03B 19/14 (2006.01), C03B 37/014 (2006.01)
Applicants: ASAHI GLASS CO., LTD. [JP/JP]; 12-1, Yurakucho 1-chome, Chiyoda-ku, Tokyo 1008405 (JP) (For All Designated States Except US).
IWATA, Kei; (For US Only).
UTO, Takao; (For US Only).
SAKUMA, Takuya; (For US Only)
Inventors: IWATA, Kei; .
UTO, Takao; .
SAKUMA, Takuya;
Agent: OGURI, Shohei; Eikoh Patent Office, 7-13, Nishi-Shimbashi 1-chome, Minato-ku, Tokyo 1050003 (JP)
Priority Data:
2005-031557 08.02.2005 JP
Title (EN) PROCESS AND APPARATUS FOR PRODUCING POROUS QUARTZ GLASS BASE
(FR) PROCEDE ET DISPOSITIF DE FABRICATION D'UNE BASE DE VERRE DE QUARTZ POREUSE
Abstract: front page image
(EN)The present invention provides a process for producing a porous quartz glass base, which comprises hydrolyzing a silicon compound in an oxyhydrogen flame in a reaction furnace to generate and deposit fine silica particles on a starting member, thereby forming a porous quartz glass base, wherein a gas discharge pipe for discharging an unnecessary gas from the reaction furnace is heated. According to the present invention, fine silica particles can be prevented from adhering to a gas discharge pipe for discharging the unnecessary hydrogen chloride gas generated in producing a porous quartz glass base.
(FR)La présente invention concerne un procédé de fabrication d'une base de verre de quartz poreuse consistant à hydrolyser un composé silicium dans une flamme d'oxyhydrogène, dans un four de réaction, de manière à produire et déposer de fines particules de silice sur un élément de départ, de manière à former une base de verre de quartz poreuse, un tube d'évacuation de gaz destiné à évacuer un gaz superflu de la réaction étant chauffé. Selon l'invention, on peut éviter que les fines particules de silice n'adhèrent au tube d'évacuation de gaz destiné à évacuer le gaz de chlorure d'hydrogène superflu produit lors de la production de la base de verre de quartz poreuse.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, KE, KG, KM, KN, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, LY, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)