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Machine translation
1. (WO2006084001) SPUTTER TARGETS WITH EXPANSION GROOVES FOR REDUCED SEPARATION
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2006/084001    International Application No.:    PCT/US2006/003635
Publication Date: 10.08.2006 International Filing Date: 02.02.2006
IPC:
C23C 14/35 (2006.01), H01J 37/34 (2006.01)
Applicants: TOSOH SMD, INC. [US/US]; 3600 Gantz Road, Grove City, Ohio 43123 (US) (For All Designated States Except US).
SMATHERS, David, B. [US/US]; (US) (For US Only)
Inventors: SMATHERS, David, B.; (US)
Agent: PEACOCK, Bruce, E.; Wegman, Hessler & Vanderburg, 6055 Rockside Woods Boulevard, Suite 200, Cleveland, Ohio 44131 (US)
Priority Data:
60/649,384 02.02.2005 US
Title (EN) SPUTTER TARGETS WITH EXPANSION GROOVES FOR REDUCED SEPARATION
(FR) CIBLES DE PULVERISATION DOTEES DE RAINURES D'EXPANSION POUR UNE SEPARATION REDUITE
Abstract: front page image
(EN)A magnetron sputtering target having at least one expansion groove strategically located on the target surface such that, during magnetron sputtering, contamination of the target surface due to separation and de-lamination of re-deposited sputtered particles from the target surface is reduced. The sputter target comprises a re-deposited layer having secondary cracks and a characteristic distance between cracks for supporting the inherent material stress associated with the thermal expansion of the target. The expansion groove is then positioned substantially within the characteristic distance to reduce separation and de-lamination of the re-deposited layer from the target surface.
(FR)L'invention concerne une cible de pulvérisation magnétron possédant au moins une rainure d'expansion située stratégiquement sur la surface cible, de telle manière que durant la pulvérisation magnétron, la contamination de la surface cible provoquée par la séparation et la délamination de particules pulvérisées redéposées de la surface cible est réduite. Cette cible de pulvérisation comporte une couche redéposée présentant des fissures secondaires et une distance caractéristique entre les fissures de manière à supporter la contrainte inhérente du matériau liée à l'expansion thermique de la cible. Ladite rainure d'expansion est, ensuite, positionnée pratiquement à l'intérieur de la distance caractéristique, afin de diminuer la séparation et la délamination de la couche redéposée de la surface cible.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, LY, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)