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1. (WO2006083919) ISO/NESTED CONTROL FOR SOFT MASK PROCESSING
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2006/083919    International Application No.:    PCT/US2006/003482
Publication Date: 10.08.2006 International Filing Date: 01.02.2006
IPC:
H01L 21/66 (2006.01)
Applicants: TOKYO ELECTRON LIMITED [JP/JP]; 3-6, Akasaka 5-chome, Ninato-ku Tokyo, 107 (JP) (For All Designated States Except US).
YAMASHITA, Asao [JP/US]; (US) (For US Only).
FUNK, Merritt [US/US]; (US) (For US Only).
PRAGER, Daniel [US/US]; (US) (For US Only)
Inventors: YAMASHITA, Asao; (US).
FUNK, Merritt; (US).
PRAGER, Daniel; (US)
Agent: KARCESKI, Jeffrey, D.; Pillsbury Winthrop Shaw Pittman LLP, 1650 Tysons Boulevard, P.O. Box 10500, Mclean, VA 22102-4859 (US)
Priority Data:
11/046,903 01.02.2005 US
Title (EN) ISO/NESTED CONTROL FOR SOFT MASK PROCESSING
(FR) CONTROLE DE STRUCTURES ISOLEES/EMBOITEES POUR LE TRAITEMENT DE MASQUE SOUPLE
Abstract: front page image
(EN)This method includes a method for etch processing that allows the bias between isolated and nested structures/features to be adjusted, correcting for a process wherein the isolated structures/features need to be smaller than the nested structures/features and wherein the nested structures/features need to be reduced relative to the isolated structures/features, while allowing for the critical control of trimming.
(FR)La présente invention a trait à un procédé pour le traitement par gravure permettant l'ajustement de la sollicitation entre des structures/éléments isolé(s) et emboîté(e)s, la correction pour un traitement dans lequel les structures/éléments isolé(e)s doivent être de taille inférieure aux structures/éléments emboîté(e)s et dans lequel les structures/éléments emboîté(e)s doivent être réduit(e)s par rapport aux structures/éléments isolé(e)s tout en permettant le contrôle critique de détourage.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, LY, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)