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Machine translation
1. (WO2006083103) POSITIVE DRY FILM PHOTORESIST AND COMPOSITION FOR PREPARING THE SAME
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2006/083103    International Application No.:    PCT/KR2006/000348
Publication Date: 10.08.2006 International Filing Date: 01.02.2006
Chapter 2 Demand Filed:    12.07.2006    
IPC:
G03F 7/022 (2006.01)
Applicants: KOLON INDUSTRIES, INC. [KR/KR]; Kolon Tower, 1-23, Byulyang-dong, Kwacheon-si, Kyunggi-do 427-040 (KR) (For All Designated States Except US).
KIM, Byoung-Kee [KR/KR]; (KR) (For US Only).
PARK, Se-Hyung [KR/KR]; (KR) (For US Only).
BYUN, Dal-Seok [KR/KR]; (KR) (For US Only).
SONG, Seog-Jeong [KR/KR]; (KR) (For US Only).
PARK, Jong-Min [KR/KR]; (KR) (For US Only)
Inventors: KIM, Byoung-Kee; (KR).
PARK, Se-Hyung; (KR).
BYUN, Dal-Seok; (KR).
SONG, Seog-Jeong; (KR).
PARK, Jong-Min; (KR)
Agent: CHO, Hwal-Rai; Suite 1507, Yoksam Hights Bldg., 642-19 Yoksam-dong, Kangnam-gu, Seoul 135-981 (KR)
Priority Data:
10-2005-0009529 02.02.2005 KR
Title (EN) POSITIVE DRY FILM PHOTORESIST AND COMPOSITION FOR PREPARING THE SAME
(FR) PHOTORESINE SECHE POSITIVE EN FILM ET COMPOSITION UTILE POUR PREPARER CETTE DERNIERE
Abstract: front page image
(EN)A positive type photoresist resin film contains a support film and a positive photoresist resin layer laminated over the support film. The photoresist layer may be formed from a composition containing a resin, a photosensitive compound, and a first solvent having a boiling point sufficiently high such that a second solvent can be removed from the composition by heating while the first solvent is substantially retained in the composition.
(FR)Un film de résine pour photorésine du type positive contient un film de support et une couche de résine de photorésine positive laminée sur le film de support. La couche de photorésine peut être formée à partir d'une composition contenant une résine, un composé photosensible et un premier solvant dont le point d'ébullition est suffisamment élevé pour permettre d'éliminer de la composition un deuxième solvant, par chauffage alors que le premier solvant reste sensiblement dans ladite composition.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KZ, LC, LK, LR, LS, LT, LU, LV, LY, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)