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1. (WO2006082848) POLYSILAZANE-TREATING SOLVENT AND METHOD FOR TREATING POLYSILAZANE BY USING SUCH SOLVENT
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2006/082848    International Application No.:    PCT/JP2006/301662
Publication Date: 10.08.2006 International Filing Date: 01.02.2006
Chapter 2 Demand Filed:    01.12.2006    
IPC:
C09D 9/00 (2006.01), B05D 7/24 (2006.01), C01B 21/068 (2006.01), C08G 77/62 (2006.01), C11D 7/24 (2006.01), C11D 7/26 (2006.01), C11D 7/50 (2006.01), H01L 21/312 (2006.01)
Applicants: AZ ELECTRONIC MATERIALS (JAPAN) K.K. [JP/JP]; Bunkyo Green Court 28-8, Honkomagome 2-chome Bunkyo-ku, Tokyo 113-0021 (JP) (AE, AG, AL, AM, AU, AZ, BA, BB, BF, BJ, BR, BW, BY, BZ, CA, CF, CG, CI, CM, CN, CO, CR, CU, DM, DZ, EC, EG, GA, GD, GE, GH, GM, GN, GQ, GW, HR, ID, IL, IN, JP, KE, KG, KM, KN, KP, KR, KZ, LC, LK, LR, LS, LY, MA, MD, MG, MK, ML, MN, MR, MW, MX, MZ, NA, NE, NG, NI, NO, NZ, OM, PG, PH, RU, SC, SD, SG, SL, SM, SN, SY, SZ, TD, TG, TJ, TM, TN, TT, TZ, UA, UG, UZ, VC, VN, YU, ZA, ZM, ZW only).
AZ ELECTRONIC MATERIALS USA CORP. [US/US]; 70 Meister Avenue Somerville, NJ 08876 (US) (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR only).
MATSUO, Hideki [JP/JP]; (JP) (For US Only).
ICHIYAMA, Masaaki [JP/JP]; (JP) (For US Only).
ISHIKAWA, Tomonori [JP/JP]; (JP) (For US Only).
AOKI, Hiroyuki [JP/JP]; (JP) (For US Only).
KIKER, Bruce [US/US]; (US) (For US Only).
OBERLANDER, Joseph [US/US]; (US) (For US Only)
Inventors: MATSUO, Hideki; (JP).
ICHIYAMA, Masaaki; (JP).
ISHIKAWA, Tomonori; (JP).
AOKI, Hiroyuki; (JP).
KIKER, Bruce; (US).
OBERLANDER, Joseph; (US)
Agent: YOSHITAKE, Kenji; Kyowa Patent & Law Office Room 323, Fuji Bldg. 2-3, Marunouchi 3-chome Chiyoda-ku, Tokyo 100-0005 (JP)
Priority Data:
2005-026818 02.02.2005 JP
Title (EN) POLYSILAZANE-TREATING SOLVENT AND METHOD FOR TREATING POLYSILAZANE BY USING SUCH SOLVENT
(FR) SOLVANT DE TRAITEMENT DU POLYSILAZANE ET PROCEDE DE TRAITEMENT DU POLYSILAZANE UTILISANT UN TEL SOLVANT
(JA) ポリシラザン処理溶剤およびこの溶剤を用いるポリシラザンの処理方法
Abstract: front page image
(EN)Disclosed is a polysilazane-treating solvent having excellent dissolving power and stability while being highly safe to humans. This polysilazane-treating solvent does not affect characteristics of a substrate foundation or a polysilazane, while enabling to obtain an excellent cut edge shape. Specifically disclosed is a polysilazane-treating solvent containing a solvent selected from the group consisting of tetralin, p-menthane, p-cymene, α-pinene, 1,8-cineole and mixtures of them. This polysilazane-treating solvent may further contain a solvent selected from the group consisting of aliphatic hydrocarbons, alicyclic hydrocarbons and mixtures of them.
(FR)L'invention concerne un solvant de traitement du polysilazane ayant un excellent pouvoir de dissolution et une excellente stabilité tout en étant totalement sans danger pour les humains. Ce solvant de traitement du polysilazane n'affecte pas les caractéristiques de base d'un substrat ou d'un polysilazane, tout en permettant d'obtenir une excellente forme de bord franc. L'invention concerne en particulier un solvant de traitement du polysilazane contenant un solvant sélectionné dans le groupe constitué par la tétraline, le p-menthane, le p-cymène, l'α-pinène, le 1,8-cinéole et les mélanges de ceux-ci. Ce solvant de traitement du polysilazane peut également contenir un solvant sélectionné dans le groupe constitué par les hydrocarbures aliphatiques, les hydrocarbures alicycliques et les mélanges de ceux-ci.
(JA) 本発明は、溶解性、安定性に優れ、基板下地やポリシラザンの特性に影響を与えず、エッジカット形状にも優れ、さらに人体に対する安全性も高いポリシラザン処理溶剤を提供するものである。この処理溶剤は、テトラリン、p-メンタン、p-シメン、α-ピネン、1,8-シネオール、およびそれらの混合物からなる群から選ばれる溶剤を含むものである。この処理溶剤は、脂肪族炭化水素、脂環式炭化水素、およびそれらの混合物からなる群から選ばれる溶剤をさらに含むこともできる。
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, LY, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)