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Machine translation
1. (WO2006082751) PROCESS FOR POLISHING GLASS SUBSTRATE
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2006/082751    International Application No.:    PCT/JP2006/301257
Publication Date: 10.08.2006 International Filing Date: 20.01.2006
IPC:
C03C 15/02 (2006.01)
Applicants: ASAHI GLASS COMPANY, LIMITED [JP/JP]; 12-1, Yurakucho 1-chome, Chiyoda-ku, Tokyo, 1008405 (JP) (For All Designated States Except US).
OTSUKA, Koji [JP/JP]; (JP) (For US Only).
ITO, Masabumi [JP/JP]; (JP) (For US Only).
KOJIMA, Hiroshi [JP/JP]; (JP) (For US Only)
Inventors: OTSUKA, Koji; (JP).
ITO, Masabumi; (JP).
KOJIMA, Hiroshi; (JP)
Agent: SENMYO, Kenji; Torimoto Kogyo Bldg., 38, Kanda-Higashimatsushitacho, Chiyoda-ku, Tokyo 101-0042 (JP)
Priority Data:
2005-026365 02.02.2005 JP
Title (EN) PROCESS FOR POLISHING GLASS SUBSTRATE
(FR) PROCEDE DE POLISSAGE DE SUBSTRAT EN VERRE
Abstract: front page image
(EN)A process for polishing a glass substrate, which enables to polish a glass substrate having a large waviness formed by mechanical polishing, to have a surface excellent in flatness, is provided. A process for polishing a glass substrate, comprising a step of measuring the surface profile of a mechanically polished glass substrate to identify the width of waviness present in the glass substrate, and a step of applying dry etching using a beam having a beam size in FWHM (full width of half maximum) value of at most the above size of waviness, to polish the surface of the glass substrate.
(FR)L'invention concerne un procédé de polissage de substrat en verre permettant de conférer par polissage à un substrat en verre présentant une grande ondulation formée par polissage mécanique, une excellente planéité de surface. Est également décrit un procédé de polissage d'un substrat de verre, qui consiste à mesurer le profil de surface d'un substrat de verre poli mécaniquement pour identifier la largeur de l'ondulation présente sur celui-ci, et à assurer une gravure au plasma au moyen d'un faisceau possédant une FWHM (moitié de la largeur maximum) d'au plus la taille d'ondulation, pour polir la surface du substrat de verre.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, KE, KG, KM, KN, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, LY, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)