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Machine translation
1. (WO2006080960) METHOD TO FORM A THIN FILM RESISTOR
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2006/080960    International Application No.:    PCT/US2005/038754
Publication Date: 03.08.2006 International Filing Date: 25.10.2005
IPC:
H01L 21/02 (2006.01)
Applicants: HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. [US/US]; Hewlett-Packard Company, Intellectual Property Administration, 20555 S.H. 249, Houston, TX 77070 (US) (For All Designated States Except US).
ULMER, Kurt [US/US]; (US) (For US Only).
EMMERICH, Tim [US/US]; (US) (For US Only)
Inventors: ULMER, Kurt; (US).
EMMERICH, Tim; (US)
Agent: COULMAN, Donald, J.; Hewlett-Packard Company, Intellectual Property Administration, P.O. Box 272400 Mail Stop 35, Fort Collins, CO 80527-2400 (US)
Priority Data:
11/042,604 24.01.2005 US
Title (EN) METHOD TO FORM A THIN FILM RESISTOR
(FR) PROCEDE DE FORMATION D'UNE RESISTANCE A COUCHE MINCE
Abstract: front page image
(EN)Embodiments of methods, pparatuses, devices, and/or systems (130) for forming a thin film resistor (100) are described.
(FR)Des modes de réalisation de l'invention concernent des procédés, des appareils, des dispositifs et/ou des systèmes (130) permettant de former une résistance à couche mince (100).
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, LY, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)