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1. WO2006054255 - OPTICAL SYSTEM FOR DETECTING MOTION OF A BODY

Publication Number WO/2006/054255
Publication Date 26.05.2006
International Application No. PCT/IB2005/053790
International Filing Date 16.11.2005
IPC
G01D 5/38 2006.1
GPHYSICS
01MEASURING; TESTING
DMEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED BY A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; TRANSFERRING OR TRANSDUCING ARRANGEMENTS NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
5Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable
26using optical means, i.e. using infra-red, visible or ultra-violet light
32with attenuation or whole or partial obturation of beams of light
34the beams of light being detected by photocells
36Forming the light into pulses
38by diffraction gratings
G03F 9/00 2006.1
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
9Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
CPC
G01D 5/38
GPHYSICS
01MEASURING; TESTING
DMEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
5Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable
26characterised by optical transfer means, i.e. using infra-red, visible, or ultra-violet light
32with attenuation or whole or partial obturation of beams of light
34the beams of light being detected by photocells
36Forming the light into pulses
38by diffraction gratings
G03F 7/70775
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70691Handling of masks or wafers
70775Position control
G03F 9/00
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
9Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
G03F 9/7003
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
9Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
70for microlithography
7003Alignment type or strategy, e.g. leveling, global alignment
G03F 9/7049
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
9Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
70for microlithography
7049Technique, e.g. interferometric
H01L 31/00
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
31Semiconductor devices sensitive to infra-red radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
Applicants
  • KONINKLIJKE PHILIPS ELECTRONICS N.V. [NL]/[NL] (AllExceptUS)
  • KLAVER, Renatus, G. [NL]/[NL] (UsOnly)
  • COMPTER, Johan, C. [NL]/[NL] (UsOnly)
  • VAN DER MEER, Piet [NL]/[NL] (UsOnly)
Inventors
  • KLAVER, Renatus, G.
  • COMPTER, Johan, C.
  • VAN DER MEER, Piet
Agents
  • REINTS BOK, Wouter
Priority Data
04105956.922.11.2004EP
Publication Language English (en)
Filing Language English (EN)
Designated States
Title
(EN) OPTICAL SYSTEM FOR DETECTING MOTION OF A BODY
(FR) SYSTEME OPTIQUE DE DETECTION DU MOUVEMENT D'UN CORPS
Abstract
(EN) The invention relates to a system (1) for detecting motion of a body (2) , said body comprising a first diffraction pattern (3A) and a second diffraction pattern (3B) with a predetermined orientation relative to said first diffraction pattern. The system comprises optical means (4A, 4B) adapted to provide at least a first incident beam to said first diffraction pattern to obtain a first diffracted beam from said first diffraction pattern and at least a second incident beam, with a predetermined orientation relative to said first incident beam, to said second diffraction pattern to obtain a second diffracted beam from said second diffraction pattern. The system has means for detecting motion of said body on the basis of the phase difference between at least one of said first diffracted beam and said second diffracted beam. Accordingly a larger in-plane rotation range is obtained for detecting motion of the body (2) . The invention also relates to a wafer (2) provided with two-dimensional diffraction patterns (3A,3B) and a method for detecting motion of a body.
(FR) L'invention concerne un système (1) de détection du mouvement d'un corps (2), ledit corps comprenant un premier modèle de diffraction (3A) et un second modèle de diffraction (3B) avec une orientation prédéterminée par rapport au premier modèle de diffraction. Le système comprend des moyens optiques (4A, 4B) adaptés pour générer au moins un premier faisceau incident sur le premier modèle de diffraction afin d'obtenir un premier faisceau de diffraction à partir du premier modèle de diffraction, et au moins un second faisceau incident, avec une orientation prédéterminée par rapport au premier faisceau incident, sur le second modèle de diffraction afin d'obtenir un second faisceau de diffraction à partir du second modèle de diffraction. Le système comprend des moyens de détection du mouvement dudit corps en fonction de la différence de phase entre au moins un des premier et second faisceaux de diffraction. Une plage supérieure de rotation dans le plan est ainsi obtenue pour détecter le mouvement du corps (2). L'invention concerne également une tranche (2) pourvue de deux modèles de diffraction bidimensionnels (3A, 3B), et un procédé de détection du mouvement d'un corps.
Latest bibliographic data on file with the International Bureau