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1. WO2006047127 - OPTICAL LENS ELEMENTS, SEMICONDUCTOR LITHOGRAPHIC PATTERNING APPARATUS, AND METHODS FOR PROCESSING SEMICONDUCTOR DEVICES

Publication Number WO/2006/047127
Publication Date 04.05.2006
International Application No. PCT/US2005/037306
International Filing Date 18.10.2005
Chapter 2 Demand Filed 19.05.2006
IPC
G02B 1/02 2006.1
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
1Optical elements characterised by the material of which they are made; Optical coatings for optical elements
02made of crystals, e.g. rock-salt, semiconductors
G02B 3/00 2006.1
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
3Simple or compound lenses
CPC
G02B 1/02
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
1Optical elements characterised by the material of which they are made
02made of crystals, e.g. rock-salt, semi-conductors
G02B 21/33
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
21Microscopes
33Immersion oils ; , or microscope systems or objectives for use with immersion fluids
G02B 3/00
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
3Simple or compound lenses
G03B 27/00
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
BAPPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
27Photographic printing apparatus
G03F 7/70341
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70216Systems for imaging mask onto workpiece
70341Immersion
G03F 7/70958
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
708Construction of apparatus, e.g. environment, hygiene aspects or materials
7095Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
70958Optical materials and coatings, e.g. with particular transmittance, reflectance
Applicants
  • SAINT-GOBAIN CERAMICS & PLASTICS, INC. [US]/[US] (AllExceptUS)
  • KOKTA, Milan R. [US]/[US]
  • JOHNSON, Rick L. [US]/[US]
  • COOKE, Jeffrey [US]/[US]
  • STONE-SUNDBERG, Jennifer [US]/[US]
Inventors
  • KOKTA, Milan R.
  • JOHNSON, Rick L.
  • COOKE, Jeffrey
  • STONE-SUNDBERG, Jennifer
Agents
  • BUJOLD, Michael J.
Priority Data
60/621,00221.10.2004US
Publication Language English (en)
Filing Language English (EN)
Designated States
Title
(EN) OPTICAL LENS ELEMENTS, SEMICONDUCTOR LITHOGRAPHIC PATTERNING APPARATUS, AND METHODS FOR PROCESSING SEMICONDUCTOR DEVICES
(FR) ELEMENTS DE LENTILLE OPTIQUE, APPAREIL DE MODELISATION LITHOGRAPHIQUE A SEMI-CONDUCTEUR ET PROCEDE POUR LE TRAITEMENT DES DISPOSITIFS A SEMI-CONDUCTEUR
Abstract
(EN) An optical lens element is disclosed, formed of single crystal spinel material, the optical element having an optical transmittance of not less than 75%. Also, a lithographic patterning apparatus is disclosed, including a radiation source and a mask having a pattern arranged downstream of the radiation source, the mask receiving radiation to provide a patterned beam. Further, a projection optic having multiple optical lens elements, at least one of which is comprised of single crystal spinel material, and a substrate table for receiving the substrate is provided. In addition, methods for processing semiconductor devices are disclosed.
(FR) La présente invention décrit un élément de lentille optique, formé d’un matériau de spinelle monocristallin, l’élément optique ayant une transmission optique d’au moins 75 %. L’invention décrit également un appareil de modélisation lithographique, comprenant une source de rayonnement et un masque ayant un modèle agencé en aval de la source de rayonnement, le masque recevant le rayonnement pour fournir un faisceau à motif. En outre, l’invention concerne une optique de projection ayant de multiples lentilles optiques, dont au moins l’une d’elles est composée d’un matériau de spinelle monocristallin, ainsi qu’une table à substrat pour recevoir le substrat. De plus, les procédés de traitement des dispositifs à semi-conducteur sont décrits.
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