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1. WO2006040850 - MULTIVALENT ION GENERATION SOURCE AND CHARGED PARTICLE BEAM APPARATUS EMPLOYING SUCH GENERATION SOURCE

Publication Number WO/2006/040850
Publication Date 20.04.2006
International Application No. PCT/JP2005/007284
International Filing Date 08.04.2005
Chapter 2 Demand Filed 13.06.2006
IPC
H01J 27/20 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
27Ion beam tubes
02Ion sources; Ion guns
20using particle bombardment, e.g. ionisers
H01J 37/08 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02Details
04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
08Ion sources; Ion guns
H01J 37/30 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
30Electron-beam or ion-beam tubes for localised treatment of objects
CPC
H01J 2237/057
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
2237Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
05Arrangements for energy or mass analysis
057Energy or mass filtering
H01J 2237/061
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
2237Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
06Sources
061Construction
H01J 2237/0815
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
2237Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
06Sources
08Ion sources
0815Methods of ionisation
H01J 2237/16
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
2237Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
16Vessels
H01J 2237/31701
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
2237Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
30Electron or ion beam tubes for processing objects
317Processing objects on a microscale
31701Ion implantation
H01J 2237/31735
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
2237Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
30Electron or ion beam tubes for processing objects
317Processing objects on a microscale
31735Direct-write microstructures
Applicants
  • 独立行政法人科学技術振興機構 JAPAN SCIENCE AND TECHNOLOGY AGENCY [JP]/[JP] (AllExceptUS)
  • 櫻井 誠 SAKURAI, Makoto [JP]/[JP] (UsOnly)
  • 中嶌 史晴 NAKAJIMA, Fumiharu [JP]/[JP] (UsOnly)
  • 福本 卓典 FUKUMOTO, Takunori [JP]/[JP] (UsOnly)
  • 中村 信行 NAKAMURA, Nobuyuki [JP]/[JP] (UsOnly)
  • 大谷 俊介 OHTANI, Shunsuke [JP]/[JP] (UsOnly)
  • 益子 信郎 MASHIKO, Shinro [JP]/[JP] (UsOnly)
Inventors
  • 櫻井 誠 SAKURAI, Makoto
  • 中嶌 史晴 NAKAJIMA, Fumiharu
  • 福本 卓典 FUKUMOTO, Takunori
  • 中村 信行 NAKAMURA, Nobuyuki
  • 大谷 俊介 OHTANI, Shunsuke
  • 益子 信郎 MASHIKO, Shinro
Agents
  • 平山 一幸 HIRAYAMA, Kazuyuki
Priority Data
2004-29689008.10.2004JP
Publication Language Japanese (JA)
Filing Language Japanese (JA)
Designated States
Title
(EN) MULTIVALENT ION GENERATION SOURCE AND CHARGED PARTICLE BEAM APPARATUS EMPLOYING SUCH GENERATION SOURCE
(FR) SOURCE DE PRODUCTION IONIQUE MULTIVALENTE ET APPAREIL À FAISCEAU DE PARTICULES CHARGÉES EMPLOYANT UNE TELLE SOURCE DE GÉNÉRATION
(JA) 多価イオン発生源およびこの発生源を用いた荷電粒子ビーム装置
Abstract
(EN)
An easy-to-manufacture multivalent ion generation source exhibiting excellent operability and maintainability while having a high degree of ionization and a high beam intensity, and a charged particle beam apparatus employing it. The multivalent ion generation source comprises an ion source electrode (3) consisting of an electron source (4), a drift tube (5) to be an ion trap region and a collector (6), a superconducting magnet (11) for trapping ions, ion introduction means (20, 22), a first vacuum container (2) containing the ion source electrode (3), a second vacuum container (10) containing the superconducting magnet (11), and vacuum exhausters (15, 16) respectively arranged for the first and second vacuum containers. The first and second vacuum containers (2, 10) are removable and can easily bake only the ion source electrode (3) requiring extremely high vacuum.
(FR)
L’invention concerne une source de production ionique multivalente facile à fabriquer, excellente en matière de manipulation et de maintenance, avec un degré élevé de ionisation et une intensité de faisceau élevée, et un appareil à faisceau de particules chargées utilisant ladite source. La source de production ionique multivalente comprend une électrode à source ionique (3) consistant en une source électronique (4), un tube de migration (5) devant constituer une région de piégeage ionique et un collecteur (6), un aimant supraconducteur (11) pour piéger des ions, un moyen d’introduction ionique (20, 22), un premier conteneur dépressurisé (2) contenant l’électrode à source ionique (3), un second conteneur dépressurisé (10) contenant l’aimant supraconducteur (11), et des circuits de purge de vide (15, 16) disposés respectivement pour le premier conteneur dépressurisé et le second conteneur dépressurisé. Le premier conteneur dépressurisé et le second conteneur dépressurisé (2, 10) sont amovibles et peuvent facilement cuire uniquement l’électrode à source ionique (3) exigeant un vide extrêmement élevé.
(JA)
製造が容易で、操作性及び保守性に優れ、電離度が高く、ビーム強度の大きい多価イオン発生源とそれを用いた荷電粒子ビーム装置であって、多価イオン発生源は、電子源(4)とイオン閉じ込め領域となるドリフトチューブ(5)とコレクタ(6)とからなるイオン源電極(3)と、イオン閉じ込めのための超伝導磁石(11)と、イオン導入手段(20,22)と、さらにイオン源電極(3)を収容した第1の真空容器(2)と、超伝導磁石(11)を収容した第2の真空容器(10)と、第1の真空容器及び第2の真空容器にそれぞれ配設した真空排気装置(15,16)とで成る。第1の真空容器(2)と第2の真空容器(10)は着脱可能であり、極高真空が必要なイオン源電極(3)のみを容易にベーキングできる。
Also published as
Latest bibliographic data on file with the International Bureau