Processing

Please wait...

Settings

Settings

Goto Application

1. WO2006039314 - METHOD AND SYSTEM FOR HOMOGENIZATION OF SUPERCRITICAL FLUID IN A HIGH PRESSURE PROCESSING SYSTEM

Publication Number WO/2006/039314
Publication Date 13.04.2006
International Application No. PCT/US2005/034749
International Filing Date 27.09.2005
IPC
H01L 21/00 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
B01D 11/02 2006.01
BPERFORMING OPERATIONS; TRANSPORTING
01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
DSEPARATION
11Solvent extraction
02of solids
B01J 3/00 2006.01
BPERFORMING OPERATIONS; TRANSPORTING
01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
3Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
B08B 7/00 2006.01
BPERFORMING OPERATIONS; TRANSPORTING
08CLEANING
BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
7Cleaning by methods not provided for in a single other subclass or a single group in this subclass
CPC
B08B 7/0021
BPERFORMING OPERATIONS; TRANSPORTING
08CLEANING
BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
7Cleaning by methods not provided for in a single other subclass or a single group in this subclass
0021by liquid gases or supercritical fluids
H01L 21/67017
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; ; Apparatus not specifically provided for elsewhere
67005Apparatus not specifically provided for elsewhere
67011Apparatus for manufacture or treatment
67017Apparatus for fluid treatment
H01L 21/67034
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; ; Apparatus not specifically provided for elsewhere
67005Apparatus not specifically provided for elsewhere
67011Apparatus for manufacture or treatment
67017Apparatus for fluid treatment
67028for cleaning followed by drying, rinsing, stripping, blasting or the like
67034for drying
Applicants
  • TOKYO ELECTRON LIMITED [JP]/[JP] (AllExceptUS)
  • TOKYO ELECTRON AMERICA, INC. [US]/[US] (JP)
  • BABIC, Darko [YU]/[US] (UsOnly)
  • GOSHI, Gentaro [JP]/[US] (UsOnly)
Inventors
  • BABIC, Darko
  • GOSHI, Gentaro
Agents
  • FREI, Donald, F.
Priority Data
10/955,32530.09.2004US
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) METHOD AND SYSTEM FOR HOMOGENIZATION OF SUPERCRITICAL FLUID IN A HIGH PRESSURE PROCESSING SYSTEM
(FR) PROCEDE ET SYSTEME D'HOMOGENEISATION DE FLUIDE SURCRITIQUE DANS UN SYSTEME DE TRAITEMENT A HAUTE PRESSION
Abstract
(EN)
A method and system (100) for providing a homogeneous processing environment in a high pressure processing system is described. A high pressure fluid and a process chemistry are mixed in a pre-mixing system (160) prior to exposure with the fluid in a supercritical state of a substrate in the high pressure processing system (110). For example, the pre-mixing system can include a fluid circulation system (120) configured to bypass the high pressure processing system until the high pressure fluid and the process chemistry are mixed. Alternatively, the pre-mixing system can include a mixing chamber, and optionally include means for agitating the high pressure fluid and process chemistry in the mixing chamber.
(FR)
L'invention porte sur un procédé et un système (100) destinés à créer un environnement de traitement homogène. Un fluide à haute pression et un additif chimique de traitement sont mélangés dans un système pré-mélangeur (160) préalablement à l'exposition d'un substrat avec le fluide dans un état surcritique dans le système de traitement à haute pression (110). Le système pré-mélangeur peut notamment comprendre un système d'écoulement de fluide (120) permettant de contourner le système de traitement à haute pression jusqu'au moment où le fluide à haute pression et l'additif chimique de traitement sont mélangés. Sinon, le système pré-mélangeur peut comprendre une chambre de mélange, et éventuellement des moyens d'agitation du fluide à haute pression et du l'additif chimique de traitement dans la chambre de mélange.
Also published as
Latest bibliographic data on file with the International Bureau