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Machine translation
1. (WO2006020643) ION BEAM MEASUREMENT SYSTEMS AND METHODS FOR ION IMPLANT DOSE AND UNIFORMITY CONTROL
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2006/020643    International Application No.:    PCT/US2005/028278
Publication Date: 23.02.2006 International Filing Date: 08.08.2005
IPC:
H01J 37/317 (2006.01)
Applicants: AXCELIS TECHNOLOGIES, INC. [US/US]; 108 Cherry Hill Drive, Beverly, Massachusetts 01915 (US) (For All Designated States Except US).
PETRY, Klaus [DE/US]; (US) (For US Only).
FERRARA, Joseph [US/US]; (US) (For US Only).
BECKER, Klaus [DE/US]; (US) (For US Only)
Inventors: PETRY, Klaus; (US).
FERRARA, Joseph; (US).
BECKER, Klaus; (US)
Priority Data:
10/917,587 13.08.2004 US
Title (EN) ION BEAM MEASUREMENT SYSTEMS AND METHODS FOR ION IMPLANT DOSE AND UNIFORMITY CONTROL
(FR) SYSTEMES ET PROCEDES DE MESURE DE FAISCEAUX IONIQUES POUR DOSE D'IMPLANT IONIQUE ET CONTROLE D'UNIFORMITE
Abstract: front page image
(EN)Dosimetry systems and methods are also presented for measuring a scanned ion beam at a plurality of points along a curvilinear path at a workpiece location in a process chamber. An illustrated dosimetry system comprises a sensor and a mounting apparatus that supports support the sensor and selectively positions the sensor at a plurality of points along the curvilinear path, wherein the mounting apparatus can selectively position the sensor to point toward a vertex of the scanned ion beam.
(FR)L'invention concerne des systèmes dosimétriques et des procédés destinés à mesurer un faisceau ionique balayé en plusieurs points, le long d'un trajet curviligne, à un emplacement d'une pièce à travailler, dans une chambre de traitement. Un système dosimétrique exemplaire comprend un capteur et un appareil de montage qui sert de support au capteur et le positionne sélectivement en plusieurs points le long du trajet curviligne. L'appareil de montage peut positionner sélectivement le capteur et l'amener à pointer vers un sommet du faisceau ionique balayé.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)