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1. (WO2006016603) TIN-ZINC ALLOY ELECTROPLATING METHOD
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2006/016603 International Application No.: PCT/JP2005/014648
Publication Date: 16.02.2006 International Filing Date: 10.08.2005
IPC:
C25D 5/26 (2006.01) ,C25D 3/60 (2006.01) ,C25D 21/10 (2006.01)
C CHEMISTRY; METALLURGY
25
ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
D
PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; JOINING WORKPIECES BY ELECTROLYSIS; APPARATUS THEREFOR
5
Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
24
Electroplating of metal surfaces to which a coating cannot readily be applied
26
of iron or steel surfaces
C CHEMISTRY; METALLURGY
25
ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
D
PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; JOINING WORKPIECES BY ELECTROLYSIS; APPARATUS THEREFOR
3
Electroplating; Baths therefor
02
from solutions
56
of alloys
60
containing more than 50% by weight of tin
C CHEMISTRY; METALLURGY
25
ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
D
PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; JOINING WORKPIECES BY ELECTROLYSIS; APPARATUS THEREFOR
21
Processes for servicing or operating cells for electrolytic coating
10
Agitating of electrolytes; Moving of racks
Applicants: YUASA, Satoshi[JP/JP]; JP (UsOnly)
DIPSOL CHEMICALS CO., LTD.[JP/JP]; 3-9, Ginza 1-chome, Chuo-ku, Tokyo 1040061, JP (AllExceptUS)
Inventors: YUASA, Satoshi; JP
Agent: KUMAKURA, Yoshio; NAKAMURA & PARTNERS, Shin-Tokyo Bldg., 3-1, Marunouchi 3-chome, Chiyoda-ku, Tokyo1008355, JP
Priority Data:
2004-23363310.08.2004JP
Title (EN) TIN-ZINC ALLOY ELECTROPLATING METHOD
(FR) MÉTHODE DE GALVANOPLASTIE A L’ALLIAGE ÉTAIN-ZINC
(JA) 錫-亜鉛合金電気めっき方法
Abstract:
(EN) Disclosed is an electroplating method realizing short-time processing which has been difficult for conventional tin-zinc alloy electroplating methods. Specifically disclosed is a method for performing tin-zinc alloy electroplating under the following conditions: the plating liquid temperature is 30-90˚C; the stirring rate of the plating liquid is 5-300 m/min; and the cathode current density is 5-200 A/dm2. Preferably, the divalent tin ion concentration in the tin-zinc alloy plating bath is 1-100 g/L, while the zinc ion concentration is 0.2-80 g/L.
(FR) Est divulguée ici une méthode de galvanoplastie avec un temps de traitement court, difficile à réaliser avec les méthodes conventionnelles de galvanoplastie à l’alliage étain-zinc. Est spécifiquement divulguée une méthode de réalisation d’une galvanoplastie à l’alliage étain-zinc dans les conditions suivantes : la température du liquide de galvanoplastie est de 30 à 90°C ; le taux de brassage du liquide de galvanoplastie est de 5 à 300 m/minute ; et la densité de courant à la cathode est de 5 à 200 A/dm2. De préférence, la concentration en ions étain bivalents dans le bain galvanoplastique d’alliage étain-zinc est de 1 à 100 g/l, alors que la concentration en ions zinc est de 0,2 à 80 g/l.
(JA)  本発明は、従来の錫-亜鉛合金電気めっきでは困難であった短時間での処理を可能にする電気めっき方法を提供することを目的とする。本発明は、めっき液温度:30~90°C、めっき液の攪拌速度:5~300m/min及び陰極電流密度:5~200A/dm2の条件下で錫-亜鉛合金電気めっきを行う方法を提供する。好ましくは、錫-亜鉛合金めっき浴中の2価の錫イオン濃度は1~100g/Lであり、亜鉛イオン濃度は0.2~80g/Lである。
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, KE, KG, KM, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (EPO) (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)