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Machine translation
1. (WO2006016004) A DEVICE AND A METHOD FOR PRODUCING A DIFFRACTIVE MICROSTRUCTURE
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2006/016004    International Application No.:    PCT/FI2005/050286
Publication Date: 16.02.2006 International Filing Date: 05.08.2005
Chapter 2 Demand Filed:    10.03.2006    
IPC:
B29C 59/02 (2006.01), B32B 38/06 (2006.01)
Applicants: AVANTONE OY [FI/FI]; Hämeenkatu 13 B, FI-33100 TAMPERE (FI) (For All Designated States Except US).
KOIVUKUNNAS, Pekka [FI/FI]; (FI) (For US Only).
KORHONEN, Raimo [FI/FI]; (FI) (For US Only).
KOIVU, Matti [FI/FI]; (FI) (For US Only)
Inventors: KOIVUKUNNAS, Pekka; (FI).
KORHONEN, Raimo; (FI).
KOIVU, Matti; (FI)
Agent: TAMPEREEN PATENTTITOIMISTO OY; Hermiankatu 12 B, FI-33720 TAMPERE (FI)
Priority Data:
20045293 13.08.2004 FI
Title (EN) A DEVICE AND A METHOD FOR PRODUCING A DIFFRACTIVE MICROSTRUCTURE
(FR) DISPOSITIF ET PROCÉDÉ DE PRODUCTION D’UNE MICROSTRUCTURE À DIFFRACTION
Abstract: front page image
(EN)According to the invention, micro-protrusions (41) which constitute a diffractive microstructure are produced by embossing the surface layer (40) of a substrate (30) by an embossing member (10) having microgrooves (11) in such a way that the cross-sectional area (A2) of a produced micro-protrusion (41) is substantially smaller than the cross-sectional area (A1) of the microgroove (11) producing said micro-protrusion (41). Thus, the required embossing pressure is small, the risk of adhesion is reduced, it is possible to use a low embossing temperature, and microstructures may be produced at a high speed. Furthermore, the same embossing member (10) may be used for producing a low microstructure, a normal microstructure, and a high microstructure.
(FR)Cette invention concerne des micro-saillies (41) qui constituent une microstructure à diffraction. Elles sont produites par le gaufrage de la couche de surface (40) d’un substrat (30) par un élément de gaufrage (10) disposant de micro-rainures (11) de telle sortes que la section transversale (A2) de la micro-saillie produite est sensiblement plus petite que la section transversale (A1) de la micro-rainure (11) produisant ladite micro-saillie (41). Ainsi, la pression de gaufrage nécessaire est faible, le risque d’adhésion est réduit, il est possible d’utiliser une température de gaufrage faible et des microstructures peuvent être produites à grande vitesse. En outre, le même élément de gaufrage (10) peut être utilisé pour produire une faible microstructure, une microstructure ordinaire et une microstructure élevée.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: Finnish (FI)