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1. (WO2006014728) POLISHING SOLUTION RETAINER
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2006/014728 International Application No.: PCT/US2005/025733
Publication Date: 09.02.2006 International Filing Date: 19.07.2005
IPC:
B24B 37/04 (2006.01) ,B24B 57/02 (2006.01)
B PERFORMING OPERATIONS; TRANSPORTING
24
GRINDING; POLISHING
B
MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
37
Lapping machines or devices; Accessories
04
designed for working plane surfaces
B PERFORMING OPERATIONS; TRANSPORTING
24
GRINDING; POLISHING
B
MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
57
Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents
02
for feeding of fluid, sprayed, pulverised, or liquefied grinding, polishing or lapping agents
Applicants: ZHANG, Hanzhong[CN/US]; US (UsOnly)
LIU, Feng, Q.[CN/US]; US (UsOnly)
TSAI, Stan, D.[CA/US]; US (UsOnly)
MAVLIEV, Rashid[RU/US]; US (UsOnly)
OLGADO, Donald[US/US]; US (UsOnly)
CHEN, Liang-Yuh[--/US]; US (UsOnly)
APPLIED MATERIALS, INC.[US/US]; 3050 Bowers Avenue Santa Clara, CA 95024, US (AllExceptUS)
Inventors: ZHANG, Hanzhong; US
LIU, Feng, Q.; US
TSAI, Stan, D.; US
MAVLIEV, Rashid; US
OLGADO, Donald; US
CHEN, Liang-Yuh; US
Agent: ZANOCCO, Jennifer; Fish & Richardson P.C. 500 Arguello Street Suite 500 Redwood City, CA 94063-1526, US
Priority Data:
10/942,60016.09.2004US
60/590,68322.07.2004US
Title (EN) POLISHING SOLUTION RETAINER
(FR) DISPOSITIF DE RETENUE D'UNE SOLUTION DE POLISSAGE
Abstract:
(EN) A substrate polishing apparatus and method are described. A base includes at least one movable platen to engage a polishing pad. At least one carrier head assembly presses a substrate against the polishing pad substantially within a polishing area during a polishing operation. A polishing solution dispenser applies a polishing solution to the polishing pad substantially within the polishing area during the polishing operation. A polishing solution retaining mechanism is attached to one of the base or the carrier head assembly. The retaining mechanism engages a top surface of the polishing pad and retains the polishing solution substantially within the polishing area during the polishing operation. Some implementations may reduce polishing solution consumption and allow for increased angular velocity.
(FR) Sont décrits un appareil et un procédé de polissage de substrat. Une base comprend au moins une platine amovible pour engager un tampon de polissage. Au moins un montage de tête de transport presse substantiellement un substrat contre le tampon de polissage dans une zone de polissage au cours d'une opération de polissage. Un distributeur de solution de polissage applique substantiellement une solution de polissage au tampon de polissage dans la zone de polissage au cours de l'opération. Un mécanisme de retenue de la solution de polissage est fixé à l'une des bases du montage de tête de transport. Le mécanisme de retenue engage une surface supérieure du tampon de polissage et maintient substantiellement la solution de polissage dans la zone de polissage pendant l'opération de polissage. Certaines applications peuvent réduire la consommation de solution de polissage et permettre d'augmenter la vitesse angulaire.
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Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (EPO) (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, LV, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)