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1. (WO2005123373) POST-DEPOSITION ENCAPSULATION OF NANOSTRUCTURES: COMPOSITIONS, DEVICES AND SYSTEMS INCORPORATING SAME
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2005/123373    International Application No.:    PCT/US2005/020100
Publication Date: 29.12.2005 International Filing Date: 07.06.2005
IPC:
B32B 5/16 (2006.01)
Applicants: NANOSYS, INC. [US/US]; 2625 Hanover Street, Palo Alto, CA 94304 (US) (For All Designated States Except US).
WHITEFORD, Jeffery, A. [US/US]; (US) (For US Only).
BREWER, Rhett [US/US]; (US) (For US Only).
BURETEA, Mihai [US/US]; (US) (For US Only).
CHEN, Jian [CN/US]; (US) (For US Only).
CRUDEN, Chu, Karen [US/US]; (US) (For US Only).
DUAN, Xiangfeng [CN/US]; (US) (For US Only).
FREEMAN, William, P. [US/US]; (US) (For US Only).
HEALD, David [US/US]; (US) (For US Only).
LEON, Francisco [US/US]; (US) (For US Only).
LIU, Chao [CN/US]; (US) (For US Only).
MEISEL, Andreas [DE/US]; (US) (For US Only).
MIN, Kyu, S. [US/US]; (US) (For US Only).
PARCE, J., Wallace [US/US]; (US) (For US Only).
SCHER, Erik [US/US]; (US) (For US Only)
Inventors: WHITEFORD, Jeffery, A.; (US).
BREWER, Rhett; (US).
BURETEA, Mihai; (US).
CHEN, Jian; (US).
CRUDEN, Chu, Karen; (US).
DUAN, Xiangfeng; (US).
FREEMAN, William, P.; (US).
HEALD, David; (US).
LEON, Francisco; (US).
LIU, Chao; (US).
MEISEL, Andreas; (US).
MIN, Kyu, S.; (US).
PARCE, J., Wallace; (US).
SCHER, Erik; (US)
Agent: QUINE, Jonathan, Alan; Quine Intellectual Property Law Group, P.C., P.O. Box 458, Alameda, CA 94501 (US)
Priority Data:
60/578,236 08.06.2004 US
60/632,570 30.11.2004 US
Title (EN) POST-DEPOSITION ENCAPSULATION OF NANOSTRUCTURES: COMPOSITIONS, DEVICES AND SYSTEMS INCORPORATING SAME
(FR) ENCAPSULATION DE NANOSTRUCTURES APRES DEPOSITION: COMPOSITIONS, DISPOSITIFS ET SYSTEMES INTEGRANT LESDITES NANOSTRUCTURES
Abstract: front page image
(EN)Ligand compositions for use in preparing discrete coated nanostructures are provided, as well as the coated nanostructures themselves and devices incorporating same. Methods for post-deposition shell formation on a nanostructure and for reversibly modifying nanostructures are also provided. The ligands and coated nanostructures of the present invention are particularly useful for close packed nanostructure compositions, which can have improved quantum confinement and/or reduced cross-talk between nanostructures.
(FR)Cette invention concerne des compositions de ligands servant à la fabrication de nanostructures revêtues discontinues, de même que les nanostructures revêtues proprement dites et des dispositifs incorporant lesdites nanostructures. Cette invention concerne également des procédés de formation de coquille après déposition sur une nanostructure et de modification réversible des nanostructures. Les ligands et les nanostructures revêtues de la présente invention sont particulièrement utiles pour les compositions de nanostructures très denses, dont on peut améliorer le confinement quantique et/ou réduire la diaphonie entre nanostructures.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)