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Machine translation
1. (WO2005123333) SINGLE COMPONENT PAD BACKER FOR POLISHING HEAD OF AN ORBITAL CHEMICAL MECHANICAL POLISHING MACHINE AND METHOD THEREFOR
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2005/123333    International Application No.:    PCT/US2005/019938
Publication Date: 29.12.2005 International Filing Date: 07.06.2005
IPC:
B24B 29/00 (2006.01), B24D 11/00 (2006.01)
Applicants: PINDER, Harvey [US/US]; (US)
Inventors: PINDER, Harvey; (US)
Agent: MOY, Jeffrey, D.; Weiss, Moy & Harris, P.C., 4204 North Brown Avenue, Scottsdale, AZ 85251 (US)
Priority Data:
60/578,987 11.06.2004 US
Title (EN) SINGLE COMPONENT PAD BACKER FOR POLISHING HEAD OF AN ORBITAL CHEMICAL MECHANICAL POLISHING MACHINE AND METHOD THEREFOR
(FR) SUPPORT DE COUSSINET A UN SEUL COMPOSANT POUR LA TETE DE POLISSAGE D'UNE MACHINE DE POLISSAGE MECANIQUE CHIMIQUE ORBITALE ET PROCEDE ASSOCIE
Abstract: front page image
(EN)A pad backer for a polishing head of an orbital chemical mechanical polishing (CMP) machine is formed of a flexible pad. A plurality of holes are formed through the flexible pad. The holes are used to accommodate tile flow of a polishing liquid from the underside of the flexible pad. A plurality of grooves are formed on a backside of the flexible pad for transferring a liquid during the polishing process.
(FR)Un support de coussinet pour une tête de polissage d'une machine de polissage chimique mécanique orbitale (CMP) est formé d'un coussinet souple. Une pluralité d'orifices sont percés dans le coussinet souple. Les orifices servent à recevoir l'écoulement d'une dalle d'un liquide de polissage provenant de la partie inférieure du coussinet souple. Une pluralité de rainures sont ménagées sur l'arrière du coussinet souple afin de transférer un liquide pendant le polissage.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)