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Machine translation
1. (WO2005123008) RADICAL POLYMERIZABLE MACROCYCLIC RESIN COMPOSITIONS WITH LOW POLYMERIZATION STRESS
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2005/123008    International Application No.:    PCT/US2005/021179
Publication Date: 29.12.2005 International Filing Date: 15.06.2005
IPC:
A61K 6/083 (2006.01), C08G 64/16 (2006.01)
Applicants: DENTSPLY INTERNATIONAL INC. [US/US]; 570 West College Avenue, P.O. 872, York, PA 17405-0872 (US) (For All Designated States Except US).
JIN, Xiaoming [CN/US]; (US) (For US Only).
HAMMESFAHR, Paul, D. [US/US]; (US) (For US Only)
Inventors: JIN, Xiaoming; (US).
HAMMESFAHR, Paul, D.; (US)
Agent: HURA, Douglas, J.; Dentsply International Inc., 570 West College Avenue, P.O. Box 872, York, PA 17405-0872 (US)
Priority Data:
60/579,836 15.06.2004 US
Title (EN) RADICAL POLYMERIZABLE MACROCYCLIC RESIN COMPOSITIONS WITH LOW POLYMERIZATION STRESS
(FR) COMPOSITIONS DE RESINE MACROCYCLIQUES POLYMERISABLES RADICALES PRESENTANT UNE FAIBLE CONTRAINTE DE POLYMERISATION
Abstract: front page image
(EN)A composition of macrocyclic oligomer with at least one polymerizable group, (meth)acrylate, for example.
(FR)L'invention concerne une composition d'oligomère macrocyclique comprenant au moins un groupe polymérisable, par exemple, du (méth)acrylate.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)