WIPO logo
Mobile | Deutsch | Español | Français | 日本語 | 한국어 | Português | Русский | 中文 | العربية |
PATENTSCOPE

Search International and National Patent Collections
World Intellectual Property Organization
Search
 
Browse
 
Translate
 
Options
 
News
 
Login
 
Help
 
Machine translation
1. (WO2005122219) SUBSTRATE HOLDING DEVICE, EXPOSURE APPARATUS HAVING SAME, EXPOSURE METHOD, METHOD FOR PRODUCING DEVICE, AND LIQUID REPELLENT PLATE
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2005/122219    International Application No.:    PCT/JP2005/010458
Publication Date: 22.12.2005 International Filing Date: 08.06.2005
IPC:
H01L 21/027 (2006.01), G03F 9/00 (2006.01), H01L 21/68 (2006.01)
Applicants: NIKON CORPORATION [JP/JP]; 2-3, Marunouchi 3-chome Chiyoda-ku, Tokyo 1008331 (JP) (For All Designated States Except US).
SHIBAZAKI, Yuichi [JP/JP]; (JP) (For US Only)
Inventors: SHIBAZAKI, Yuichi; (JP)
Agent: KAWAKITA, Kijuro; YKB Mike Garden 5-4, Shinjuku 1-chome Shinjuku-ku, Tokyo 1600022 (JP)
Priority Data:
2004-171116 09.06.2004 JP
2004-205008 12.07.2004 JP
Title (EN) SUBSTRATE HOLDING DEVICE, EXPOSURE APPARATUS HAVING SAME, EXPOSURE METHOD, METHOD FOR PRODUCING DEVICE, AND LIQUID REPELLENT PLATE
(FR) DISPOSITIF DE MAINTIEN DE SUBSTRAT, APPAREIL D’EXPOSITION AYANT LEDIT DISPOSITIF, PROCEDE D’EXPOSITION, PROCEDE DE FABRICATION DU DISPOSITIF ET PLAQUE HYDROPHOBE
(JA) 基板保持装置及びそれを備える露光装置、露光方法、デバイス製造方法、並びに撥液プレート
Abstract: front page image
(EN)Disclosed is a substrate holder (PH) comprising a base (PHB), a first holding unit (PH1) which is formed on the base (PHB) for suction-holding a substrate (P), and a second holding unit (PH2) which is formed on the base (PHB) for suction-holding a plate member (T) near the substrate (P) suction-held by the first holding unit (PH1). In an exposure apparatus comprising such a substrate holder (PH), plates can be exchanged easily, thereby making the maintenance of the apparatus easy. Consequently, such an exposure apparatus is suitable for immersion exposure.
(FR)Il est prévu un support de substrat (PH) comprenant une base (PHB), une première unité de maintien (PH1) formée sur la base (PHB) pour maintenir un substrat (P) par aspiration, et une seconde unité de maintien (PH2) sur la base (PHB) pour maintenir par aspiration un élément à plaque (T) près du substrat (P) maintenu par aspiration par la première unité de maintien (PH1). Dans un appareil d’exposition comprenant un tel support de substrat (PH), les plaques peuvent être échangées facilement, favorisant ainsi la maintenance de l’appareil. En conséquence, un tel appareil d’exposition convient à une exposition par immersion.
(JA)基板ホルダPHは、基材PHBと、基材PHBに形成され且つ基板Pを吸着保持する第1保持部PH1と、基材PHBに形成され且つ第1保持部PH1に吸着保持された基板Pの近傍にプレート部材Tを吸着保持する第2保持部PH2とを備えている。基板ホルダPHを備える露光装置は、プレートの交換が容易であり、メンテナンスが容易である。それゆえ、液浸露光に好適である。
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, KE, KG, KM, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)