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Machine translation
1. (WO2005122218) EXPOSURE SYSTEM AND DEVICE PRODUCTION METHOD
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2005/122218    International Application No.:    PCT/JP2005/010412
Publication Date: 22.12.2005 International Filing Date: 07.06.2005
IPC:
H01L 21/027 (2006.01), G03F 7/20 (2006.01)
Applicants: NIKON CORPORATION [JP/JP]; 2-3, Marunouchi 3-chome, Chiyoda-ku, Tokyo 1008331 (JP) (For All Designated States Except US).
SHIRAISHI, Kenichi [JP/JP]; (JP) (For US Only)
Inventors: SHIRAISHI, Kenichi; (JP)
Agent: SHIGA, Masatake; 2-3-1, Yaesu Chuo-ku, Tokyo 1048453 (JP)
Priority Data:
2004-171115 09.06.2004 JP
Title (EN) EXPOSURE SYSTEM AND DEVICE PRODUCTION METHOD
(FR) SYSTÈME D’EXPOSITION ET MÉTHODE DE PRODUCTION DU DISPOSITIF
(JA) 露光装置及びデバイス製造方法
Abstract: front page image
(EN)An exposure system capable of accurately carrying out an exposing process and a measuring process based on an immersion method. The exposure system (EX), which forms the immersion area (AR2) of a liquid (LQ) on the image surface side of a projection optical system (PL) and exposes a substrate (P) to light via the projection optical system (PL) and the liquid (LQ) of the immersion area (AR2), is provided with a measuring device (60) for measuring at least one of the property and component of the liquid (LQ) forming the immersion area (AR2).
(FR)L’invention a trait à un système d’exposition capable de réaliser très précisément un processus d’exposition et un processus de mesure sur base d’une méthode d’immersion. Le système d’exposition (EX) qui constitue la zone d’immersion (AR2) d’un liquide (LQ) sur la surface de l’image d’un système optique de projection (PL) et qui expose un substrat (P) à la lumière via le système optique de projection (PL) et le liquide (LQ) de la zone d’immersion (AR2), est fourni avec un dispositif de mesure (60) pour mesurer au moins une des propriétés et des composants du liquide (LQ) formant la zone d’immersion (AR2).
(JA) 液浸法に基づく露光処理及び計測処理を精度良く行うことができる露光装置を提供する。露光装置(EX)は、投影光学系(PL)の像面側に液体(LQ)の液浸領域(AR2)を形成し、投影光学系(PL)と液浸領域(AR2)の液体(LQ)とを介して基板(P)を露光するものであって、液浸領域(AR2)を形成するための液体(LQ)の性質及び成分のうち少なくともいずれか一方を計測する計測装置(60)を備えている。
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)