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1. (WO2005122195) FABRICATION OF INTERCONNECT STRUCTURES
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2005/122195    International Application No.:    PCT/US2005/018196
Publication Date: 22.12.2005 International Filing Date: 23.05.2005
Chapter 2 Demand Filed:    04.01.2006    
IPC:
H01L 21/302 (2006.01), H01L 21/311 (2006.01)
Applicants: INTERNATIONAL BUSINESS MACHINES CORPORATION [US/US]; New Orchard Road, Armonk, NY 10504 (US) (For All Designated States Except US).
HUANG, Elbert, E. [US/US]; (US) (For US Only).
KIM, Hyungjun [KR/US]; (US) (For US Only).
MILLER, Robert, D. [US/US]; (US) (For US Only).
NITTA, Satyanarayana, V. [IN/US]; (US) (For US Only).
PURUSHOTHAMAN, Sampath [US/US]; (US) (For US Only)
Inventors: HUANG, Elbert, E.; (US).
KIM, Hyungjun; (US).
MILLER, Robert, D.; (US).
NITTA, Satyanarayana, V.; (US).
PURUSHOTHAMAN, Sampath; (US)
Agent: AMERNICK, Burton, A.; Connolly, Bove, Lodge & Hutz LLP., 1990 M Street, N.W., Suite 800, Washington, DC 2003-63425 (US)
Priority Data:
60/576,924 04.06.2004 US
Title (EN) FABRICATION OF INTERCONNECT STRUCTURES
(FR) FABRICATION DE STRUCTURES D'INTERCONNEXION
Abstract: front page image
(EN)Interconnect structures are fabricated by methods that comprise depositing a thin conformal passivation dielectric and/or diffusion barrier cap and/or hard mask by an atomic layer deposition or supercritical fluid based process.
(FR)L'invention concerne des structures d'interconnexion qui sont fabriquées selon des procédés qui consistent à déposer un diélectrique de passivation conformé mince et/ou une couverture de barrière de diffusion et/ou un masque dur par dépôt de couches atomiques ou par un processus à base de fluides supercritiques.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)