WIPO logo
Mobile | Deutsch | Español | Français | 日本語 | 한국어 | Português | Русский | 中文 | العربية |
PATENTSCOPE

Search International and National Patent Collections
World Intellectual Property Organization
Search
 
Browse
 
Translate
 
Options
 
News
 
Login
 
Help
 
Machine translation
1. (WO2005121903) SYSTEM AND METHOD FOR IMPROVEMENT OF ALIGNMENT AND OVERLAY FOR MICROLITHOGRAPHY
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2005/121903    International Application No.:    PCT/US2005/019392
Publication Date: 22.12.2005 International Filing Date: 02.06.2005
IPC:
G03F 9/00 (2006.01)
Applicants: BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM [US/US]; 201West 7th Street, 7th Floor, Austin, Texas 78701 (US) (For All Designated States Except US)
Inventors: CHERALA, Anshuman; (US).
SREENIVASAN, Sidlgata V.; (US).
ADUSUMILLI, Kranthimitra; (US)
Agent: BROOKS, Kenneth, C.; P.O. Box 81536, Austin, Texas 78708-1536 (US)
Priority Data:
60/576,570 03.06.2004 US
Title (EN) SYSTEM AND METHOD FOR IMPROVEMENT OF ALIGNMENT AND OVERLAY FOR MICROLITHOGRAPHY
(FR) SYSTEME ET PROCEDE D'AMELIORATION D'UN ALIGNEMENT ET D'UNE SUPERPOSITION POUR MICROLITHOGRAPHIE
Abstract: front page image
(EN)The present invention provides a method for determining the forces to be applied to a substrate in order to deform the same and correct for overlay misalignment.
(FR)La présente invention concerne un procédé de détermination des forces à appliquer sur un substrat en vue de déformer ce dernier et de corriger le désalignement de la superposition.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)