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1. (WO2005121398) THIN DIAMOND FILM COATING METHOD AND CEMENTED CARBIDE MEMBER COATED WITH DIAMOND THIN FILM
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2005/121398    International Application No.:    PCT/JP2005/010675
Publication Date: 22.12.2005 International Filing Date: 10.06.2005
Chapter 2 Demand Filed:    23.03.2006    
IPC:
C23C 16/02 (2006.01), C23C 8/08 (2006.01), C23C 14/14 (2006.01), C23C 14/16 (2006.01), C23C 14/58 (2006.01), C23C 16/26 (2006.01), C23C 28/04 (2006.01), B23B 27/14 (2006.01), B23B 27/20 (2006.01)
Applicants: THE UNIVERSITY OF ELECTRO-COMMUNICATIONS [JP/JP]; 1-5-1, Chofugaoka, Chofu-shi, Tokyo, 1828585 (JP) (For All Designated States Except US).
CAMPUS CREATE CO., LTD. [JP/JP]; 48-14, Okusawa 1-chome, Setagaya-ku, Tokyo 158-0083 (JP) (For All Designated States Except US).
NITTOKU ENGINEERING CO., LTD. [JP/JP]; 11-20, Shirahata 5-chome, Minami-ku, Saitama-shi, Saitama 336-8561 (JP) (JP only).
ISSHIKI, Hideo; (For US Only)
Inventors: ISSHIKI, Hideo;
Agent: MIYOSHI, Hidekazu; Toranomon Kotohira Tower, 2-8, Toranomon 1-chome, Minato-ku, Tokyo 1050001 (JP)
Priority Data:
2004-173078 10.06.2004 JP
Title (EN) THIN DIAMOND FILM COATING METHOD AND CEMENTED CARBIDE MEMBER COATED WITH DIAMOND THIN FILM
(FR) PROCÉDÉ D’ENROBAGE PAR COUCHE MINCE DE DIAMANT ET ÉLÉMENT EN CARBURE CÉMENTÉ ENROBÉ AVEC UNE COUCHE MINCE DE DIAMANT
(JA) ダイヤモンド薄膜のコーティング法及びダイヤモンド被覆超硬合金部材
Abstract: front page image
(EN)A thin diamond film coating method which comprises silicificating the cobalt in the binding phase (11) being present in the surface of a cemented carbide substrate composed of a hard phase of a carbice (2) and a binding phase (1) containing cobalt into a silicide (3), and then forming a thin diamond film. The above method allows the formation of a thin diamond film on a cemented carbide substrate, which has been difficult conventionally, without the need for an intermediate layer, by the utilization of the catalytic action of the cobalt contained in the binding phase in cemented carbides for the formation of graphite.
(FR)Procédé d’enrobage par couche mince de diamant qui comprend la silicification du cobalt dans la phase de fixation (11) présente à la surface d’un substrat de carbure cémenté composé d’une phase solide constituée d’un carbure très dur (2) et une phase de fixation (1) contenant du cobalt dans un siliciure (3), et ensuite la formation d’une couche mince de diamant. Le procédé précédent permet la formation d’une couche mince de diamant sur un substrat de carbure cémenté, lequel a été difficile à mettre en œuvre de façon conventionnelle, sans la nécessité d’une couche intermédiaire, par l’utilisation de l’action catalytique du cobalt contenu dans la phase de fixation dans les carbures cémentés en vue de la formation du graphite.
(JA) 超硬合金の結合相に含まれるコバルトがグラファイト形成の触媒作用をすることにより従来困難とされてきたダイヤモンド薄膜の形成を、中間層を必要とすることなく可能にするダイヤモンド薄膜のコーティング法を提供する。  炭化物2の硬質相とコバルトを含む結合相1とからなる超硬合金基材の表面に存在する結合相11のコバルトを珪化して珪化物3とし、しかる後に前記ダイヤモンド薄膜を形成する。
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)