WIPO logo
Mobile | Deutsch | Español | Français | 日本語 | 한국어 | Português | Русский | 中文 | العربية |
PATENTSCOPE

Search International and National Patent Collections
World Intellectual Property Organization
Search
 
Browse
 
Translate
 
Options
 
News
 
Login
 
Help
 
Machine translation
1. (WO2005121193) POLYMER, POSITIVE RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2005/121193    International Application No.:    PCT/JP2005/010135
Publication Date: 22.12.2005 International Filing Date: 02.06.2005
IPC:
C08F 32/08 (2006.01), G03F 7/039 (2006.01), H01L 21/30 (2006.01)
Applicants: TOKYO OHKA KOGYO CO., LTD. [JP/JP]; 150, Nakamaruko, Nakahara-ku, Kawasaki-shi Kanagawa 2110012 (JP) (For All Designated States Except US).
TAKESHITA, Masaru [JP/JP]; (JP) (For US Only).
HADA, Hideo [JP/JP]; (JP) (For US Only).
HAYASHI, Ryotaro [JP/JP]; (JP) (For US Only).
IWAI, Takeshi [JP/JP]; (JP) (For US Only).
MATSUMARU, Syogo [JP/JP]; (JP) (For US Only).
FUJIMURA, Satoshi [JP/JP]; (JP) (For US Only)
Inventors: TAKESHITA, Masaru; (JP).
HADA, Hideo; (JP).
HAYASHI, Ryotaro; (JP).
IWAI, Takeshi; (JP).
MATSUMARU, Syogo; (JP).
FUJIMURA, Satoshi; (JP)
Agent: TANAI, Sumio; 2-3-1, Yaesu, Chuo-ku Tokyo, 1048453 (JP)
Priority Data:
2004-169589 08.06.2004 JP
2004-169590 08.06.2004 JP
Title (EN) POLYMER, POSITIVE RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
(FR) POLYMERE, COMPOSITION DE RESIST POSITIF ET PROCEDE POUR FORMER UN TYPE DE RESIST
(JA) 重合体、ポジ型レジスト組成物およびレジストパターン形成方法
Abstract: front page image
(EN)Disclosed is a polymer which enables to form a resist pattern having high resolution and excellent etching resistance. Also disclosed are a positive resist composition and a method for forming a resist pattern. Specifically disclosed are a polymer having a constitutional unit (a1) represented by the general formula (a-1) below and a constitutional unit (a2) represented by the general formula (a-2) below, another polymer having the constitutional unit (a1) and a constitutional unit (a3) represented by the general formula (a-3) below, and a still another polymer having the constitutional unit (a1), the constitutional unit (a2) and the constitutional unit (a3). (a-1) (a-2) (a-3)
(FR)Le polymère décrit permet de former un type de résist ayant une haute résolution et une excellente résistance à la gravure. Sont aussi décrits une composition de résist positif et un procédé pour former un type de résist. Sont spécifiquement décrits un polymère ayant une unité constitutive (a1) représentée par la formule générale (a-1) ci-dessous et une unité constitutive (a2) représentée par la formule générale (a-2) ci-dessous, un autre polymère ayant une unité constitutive (a1) et une unité constitutive (a3) représentée par la formule générale (a-3) ci-dessous, et encore un autre polymère ayant l'unité constitutive (a1), l'unité constitutive (a2) et l'unité constitutive (a-3). (a-1) (a-2) (a-3)
(JA) 高解像性で、しかもエッチング耐性にも優れたレジストパターンを形成できる重合体、ポジ型レジスト組成物およびレジストパターン形成方法を提供する。本発明は、下記一般式(a-1)で表される構成単位(a1)と、下記一般式(a-2)で表される構成単位(a2)とを有する重合体、構成単位(a1)と、下記一般式(a-3)で表される構成単位(a3)とを有する重合体、構成単位(a1)と、構成単位(a2)と、構成単位(a3)とを有する重合体を用いる。 
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, KE, KG, KM, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)