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1. (WO2005119731) VACUUM PLASMA PROCESSOR INCLUDING CONTROL IN RESPONSE TO DC BIAS VOLTAGE
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2005/119731    International Application No.:    PCT/US2005/018094
Publication Date: 15.12.2005 International Filing Date: 25.05.2005
IPC:
H01J 37/32 (2006.01)
Applicants: LAM RESEARCH CORPORATION [US/US]; 4650 Cushing Parkway, Fremont, CA 94538 (US) (For All Designated States Except US).
DHINDSA, Rajinder [US/US]; (US) (For US Only).
KOZAKEVICH, Felix [US/US]; (US) (For US Only).
TRUSSELL, Dave [US/US]; (US) (For US Only)
Inventors: DHINDSA, Rajinder; (US).
KOZAKEVICH, Felix; (US).
TRUSSELL, Dave; (US)
Agent: LOWE, Allan, M.; Lowe Hauptman & Berner, LLP, Suite 300, 1700 Diagonal Rd., Alexandria, VA 22314 (US)
Priority Data:
10/855,707 28.05.2004 US
Title (EN) VACUUM PLASMA PROCESSOR INCLUDING CONTROL IN RESPONSE TO DC BIAS VOLTAGE
(FR) APPAREIL DE TRAITEMENT AU PLASMA SOUS VIDE COMPRENANT UNE COMMANDE EN REPONSE A UNE TENSION DE POLARISATION A COURANT CONTINU
Abstract: front page image
(EN)A plasma processor chamber includes a bottom electrode and a top electrode assembly having a center electrode surrounded by a grounded electrode. RF excited plasma between the electrodes induces a DC bias on them. A measure of the bottom electrode DC bias controls the capacitance of a first series resonant circuit connected between the center electrode and ground. A measure of the center electrode DC bias controls the capacitance of a second series resonant circuit connected between the bottom electrode and ground.
(FR)Selon cette invention, une chambre de traitement au plasma comprend un ensemble électrode inférieure et électrode supérieure comportant une électrode centrale entourée par une électrode mise à la terre. Le plasma excité par RF entre les électrodes induit sur celles-ci une polarisation courant continu. Une mesure de la polarisation courant continu de l'électrode inférieure commande la capacité d'un premier circuit résonnant série connecté entre l'électrode centrale et la terre. Une mesure de la polarisation courant continu de l'électrode centrale commande la capacité d'un second circuit résonnant série connecté entre l'électrode inférieure et la terre.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)