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1. (WO2005119367) WATER-REPELLENT COMPOSITION, WATER-REPELLENT THIN FILM, AND THIN FILM WITH WATER-REPELLENT/HYDROPHILIC PATTERN
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2005/119367    International Application No.:    PCT/JP2005/009479
Publication Date: 15.12.2005 International Filing Date: 24.05.2005
Chapter 2 Demand Filed:    09.09.2005    
IPC:
G03F 7/004 (2006.01), H01L 21/027 (2006.01)
Applicants: ASAHI GLASS COMPANY, LIMITED [JP/JP]; 12-1, Yurakucho 1-chome, Chiyoda-ku, Tokyo 1008405 (JP) (For All Designated States Except US).
FURUKAWA, Yutaka [JP/JP]; (JP) (For US Only).
OKAZOE, Takashi [JP/JP]; (JP) (For US Only)
Inventors: FURUKAWA, Yutaka; (JP).
OKAZOE, Takashi; (JP)
Agent: SENMYO, Kenji; Torimoto Kogyo Bldg. 38, Kanda-Higashimatsushitacho Chiyoda-ku, Tokyo 1010042 (JP)
Priority Data:
2004-167292 04.06.2004 JP
Title (EN) WATER-REPELLENT COMPOSITION, WATER-REPELLENT THIN FILM, AND THIN FILM WITH WATER-REPELLENT/HYDROPHILIC PATTERN
(FR) COMPOSITION HYDROFUGE, FILM FIN HYDROFUGE ET FILM FIN AVEC DES CARACTÉRISTIQUES HYDROFUGES/HYDROPHILES
(JA) 撥水性組成物、撥水性薄膜および撥水性親水性パターンを有する薄膜
Abstract: front page image
(EN)A water-repellent composition from which a thin film having a water-repellent/hydrophilic pattern can be easily formed with the aid of a light having relatively low energy. The water-repellent composition comprises a water-repellent compound (A) which decomposes by the action of an acid to come to have reduced water repellency (e.g., Rf2OCOR3Si(R4)3-mX2m, wherein Rf2 is monovalent polyfluoroalkyl, R3 is alkylene, R4 is methyl, X is a hydrolyzable group, and m is an integer of 1-3) and a compound (B) which decomposes upon irradiation with a light having a wavelength of 200 nm or longer to generate an acid. A thin film formed from the composition is irradiated with a light to form a thin film having a water-repellent/hydrophilic pattern.
(FR)Une composition hydrofuge à partir de laquelle il est facile de former une pellicule fine ayant des caractéristiques hydrofuge/hydrophile à l'aide d'une lumière de niveau énergétique relativement bas. La composition hydrofuge comprend un composé hydrofuge (A) qui décompose, par action d'un acide anticipé ayant des caractéristiques hydrofuges réduites (par ex., Rf2OCOR3Si(R4)3-mX2m, où Rf2 est un polyfluoroalkyl monovalent, R3 est un alkylène, R4 est méthyl, X est un groupe hydrolysable et m est un entier entre 1 et 3) et un composé (B) qui se décompose sous irradiation avec une lumière dont la longueur d'onde est 200 nm ou plus, pour produire un acide. Une pellicule fine formée à partir de la composition est irradiée avec une lumière pour former une pellicule fine avec des caractéristiques hydrofuges/hydrophiles.
(JA) 比較的低エネルギーの光を用いて、撥水性親水性パターンを有する薄膜を容易に形成できる撥水性組成物を提供する。  酸により分解して撥水性が低下する撥水性化合物A(たとえば、Rf2OCORSi(R3-m 、ただし、Rf2:1価ポリフルオロアルキル基、R:アルキレン基、R:メチル基、X:加水分解性基、m:1~3の整数。)、波長200nm以上の光により分解して酸を発生する化合物Bを含む撥水性組成物。それを用いて形成した薄膜に、光を照射することにより形成した撥水性親水性パターンを有する薄膜。
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, KE, KG, KM, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)