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Machine translation
1. (WO2005118656) PHOTORESISTS COMPRISING POLYMERS DERIVED FROM FLUOROALCOHOL-SUBSTITUTED POLYCYCLIC MONOMERS
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2005/118656    International Application No.:    PCT/US2005/017325
Publication Date: 15.12.2005 International Filing Date: 17.05.2005
Chapter 2 Demand Filed:    16.03.2006    
IPC:
C08F 214/18 (2006.01), C08F 214/26 (2006.01), G03F 7/004 (2006.01)
Applicants: E.I. DUPONT DE NEMOURS AND COMPANY [US/US]; 1007 MARKET STREET, WILMINGTON, Delaware 19898 (US) (For All Designated States Except US).
CRAWFORD, Michael, Karl [US/US]; (US) (For US Only).
TRAN, Hoang, Vi [US/US]; (US) (For US Only).
SCHADT, Frank, L., III [US/US]; (US) (For US Only).
ZUMSTEG, Frederick, Claus, Jr. [US/US]; (US) (For US Only).
FEIRING, Andrew, Edward [US/US]; (US) (For US Only).
FRYD, Michael [US/US]; (US) (For US Only)
Inventors: CRAWFORD, Michael, Karl; (US).
TRAN, Hoang, Vi; (US).
SCHADT, Frank, L., III; (US).
ZUMSTEG, Frederick, Claus, Jr.; (US).
FEIRING, Andrew, Edward; (US).
FRYD, Michael; (US)
Agent: KAEDING, Konrad S.; E. I. DU PONT DE NEMOURS AND COMPANY, LEGAL PATENT RECORDS CENTER, 4417 Lancaster Pike, Wilmington, Delaware 19805 (US)
Priority Data:
60/572,734 20.05.2004 US
Title (EN) PHOTORESISTS COMPRISING POLYMERS DERIVED FROM FLUOROALCOHOL-SUBSTITUTED POLYCYCLIC MONOMERS
(FR) PHOTORESINES COMPRENANT DES POLYMERES DERIVES DE MONOMERES POLYCYCLIQUES SUBSTITUES PAR UN ALCOOL FLUORE
Abstract: front page image
(EN)The present invention relates to novel unsaturated polycyclic compounds containing two fluoroalcohol substitutents. This invention also relates to homopolymers and copolymers derived from such unsaturated polycyclic compounds. The copolymers are useful for photoimaging compositions and, in particular, photoresist compositions (positive-working and/or negative-working) for imaging in the production of semiconductor devices. The polymers are especially useful in photoresist compositions having high UV transparency (particularly at short wavelengths, e.g., 157 nm) which are useful as base resins in resists and potentially in many other applications.
(FR)Cette invention concerne de nouveaux composés polycycliques insaturés contenant deux substituants alcool fluoré. Cette invention concerne également des homopolymères et des copolymères dérivés de ces composés polycycliques insaturés. Les copolymères sont utilisés dans des compositions de formation d'images et en particulier dans des compositions de résine photosensible (positive et/ou négative) pour la formation d'images dans la production de dispositifs à semi-conducteurs. Les polymères sont particulièrement utilisés dans des compositions de résine photosensible présentant une transparence élevée aux ultraviolets (en particulier à des longueurs d'ondes courtes, par exemple à 157 nm) qui sont utilisées comme résines de base dans des réserves et éventuellement dans de nombreuses autres applications.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)