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1. (WO2005116119) NOVEL OXONOL COMPOUND AND PROCESS FOR PRODUCING THE COMPOUND
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2005/116119    International Application No.:    PCT/JP2005/010097
Publication Date: 08.12.2005 International Filing Date: 26.05.2005
IPC:
C08J 5/18 (2006.01), C08L 1/10 (2006.01), C08K 3/00 (2006.01), C08K 5/103 (2006.01), C08K 5/52 (2006.01)
Applicants: FUJIFILM Corporation [JP/JP]; 26-30, Nishiazabu 2-chome, Minato-ku, Tokyo 1060031 (JP) (For All Designated States Except US).
MIKOSHIBA, Hisashi; (For US Only).
AKIBA, Masaharu; (For US Only)
Inventors: MIKOSHIBA, Hisashi; .
AKIBA, Masaharu;
Agent: OGURI, Shohei; Eikoh Patent Office, 7-13, Nishi-Shimbashi 1-chome, Minato-ku, Tokyo 1050003 (JP)
Priority Data:
2004-158997 28.05.2004 JP
Title (EN) NOVEL OXONOL COMPOUND AND PROCESS FOR PRODUCING THE COMPOUND
(FR) NOUVEAU COMPOSÉ OXONOL ET PROCÉDÉ SERVANT À PRODUIRE LE COMPOSÉ
Abstract: front page image
(EN)A compound represented by the formula (I) defined herein, and a process producing the compound represented by the formula (I) which comprises reacting the compound represented by the formula (III) defined herein with the compound represented by the formula (IV) defined herein.
(FR)Composé représenté par la formule (I) définie ici et procédé produisant le composé représenté par la formule (I) lequel comprend de faire réagir le composé représenté par la formule (III) définie ici avec le composé représenté par la formule (IV) définie ici.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, KE, KG, KM, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)