WIPO logo
Mobile | Deutsch | Español | Français | 日本語 | 한국어 | Português | Русский | 中文 | العربية |
PATENTSCOPE

Search International and National Patent Collections
World Intellectual Property Organization
Search
 
Browse
 
Translate
 
Options
 
News
 
Login
 
Help
 
Machine translation
1. (WO2005114719) METHOD OF FORMING A RECESSED STRUCTURE EMPLOYING A REVERSE TONE PROCESS
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2005/114719    International Application No.:    PCT/US2005/017756
Publication Date: 01.12.2005 International Filing Date: 19.05.2005
IPC:
C23F 1/00 (2006.01), H01L 21/461 (2006.01)
Applicants: MOLECULAR IMPRINTS, INC. [US/US]; 1807 West Braker Ln, Bldg. C-100 Austin, TX 78758-3605 (US) (For All Designated States Except US)
Inventors: SREENIVASAN, Sidlgata, V.; (US)
Agent: BROOKS, Kenneth, C.; P.O. Box 81536, Austin, Texas 78708-1536 (US)
Priority Data:
10/850,876 21.05.2004 US
10/946,570 21.09.2004 US
Title (EN) METHOD OF FORMING A RECESSED STRUCTURE EMPLOYING A REVERSE TONE PROCESS
(FR) MÉTHODE DE FORMATION D'UNE STRUCTURE ENCASTRÉE UTILISANT UN PROCESSUS DE TONALITÉ INVERSÉE
Abstract: front page image
(EN)The present invention provides a method of forming recesses on a substrate, the method including forming on the substrate a patterning layer having first features; trim etching the first features to define trimmed features having a shape; and transferring an inverse of the shape into the substrate.
(FR)La présente invention fournit une méthode de formation d'intersession sur un substrat, la méthode incluant la formation sur le substrat d'une couche de modèle ayant des fonctions premières; parage des premières fonctions pour définir les fonctions parées ayant une forme; et transfert d'un inverse de la forme dans le substrat.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)