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1. (WO2005112745) OPTIMIZED WAVELENGTH GAP FOR IMPROVED StO2 MEASUREMENT
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2005/112745    International Application No.:    PCT/US2005/018000
Publication Date: 01.12.2005 International Filing Date: 18.05.2005
Chapter 2 Demand Filed:    27.02.2006    
IPC:
A61B 5/00 (2006.01), G01N 21/31 (2006.01)
Applicants: HUTCHINSON TECHNOLOGY INCORPORATED [US/US]; 40 West Highland Park, Hutchinson, MN 55350-9784 (US) (For All Designated States Except US).
MYERS, Dean E. [US/US]; (US) (For US Only)
Inventors: MYERS, Dean E.; (US)
Agent: LEONARD, Robert B.; 2200 Wells Fargo Center, 90 South Seventh Street, Minneapolis, Minnesota 55402-3901 (US)
Priority Data:
60/572,220 18.05.2004 US
Title (EN) OPTIMIZED WAVELENGTH GAP FOR IMPROVED StO2 MEASUREMENT
(FR) ECART DE LONGUEUR D'ONDE OPTIMISE POUR MESURE AMELIOREE DE LA SAO2
Abstract: front page image
(EN)A method and system for producing improved more accurate measurements of oxyhemoglobin levels in tissue when measured using near infrared spectroscopy (NIRS). Light sources and processing methods are selected to such that the effects of a confounding chromophore in the tissue under study are minimized.
(FR)L'invention concerne un procédé et un système qui permettent de produire des mesures améliorées plus précises des niveaux d'oxyhémoglobine dans les tissus lorsque ces derniers sont mesurés par spectroscopie de réflexion dans l'infrarouge proche (NIRS). Les sources lumineuses et les procédés de traitement sont choisis de manière à minimiser les effets d'un chromophore de confusion dans les tissus étudiés.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)