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|1. (WO2005111674) BLACK RESIST COMPOSITION FOR COLOR FILTER|
|Applicants:||SHOWA DENKO K.K.
|Title:||BLACK RESIST COMPOSITION FOR COLOR FILTER|
Disclosed is a black resist composition for color filters which contains titanium black (A) having an average primary particle size of not more than 100 nm, carbon black (B) having an average primary particle size of not more than 60 nm, an acrylic copolymer dispersing agent (C) having an amino group and/or a quaternary ammonium salt, an organic solvent (D) and a binder resin (E) having a carboxyl group and an ethylenically unsaturated group. In this black resist composition, the mass ratio between the titanium black as the component (A) and the carbon black as the component (B) is 100:5-1000. With such a black resist composition for color filters, a pattern can be easily formed by a photolithography process, and can be made thin with sufficient sensitivity and resolution while exhibiting excellent light-blocking properties and insulating properties.