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1. (WO2005111674) BLACK RESIST COMPOSITION FOR COLOR FILTER

Pub. No.:    WO/2005/111674    International Application No.:    PCT/JP2005/009109
Publication Date: Nov 24, 2005 International Filing Date: May 12, 2005
IPC: G02B 5/20
C09D 11/02
G03F 7/004
G03F 7/027
Applicants: SHOWA DENKO K.K.
昭和電工株式会社
Inventors: ONISHI, Mina
大西 美奈
KAMIJO, Masanao
上條 正直
MUROFUSHI, Katsumi
室伏 克己
Title: BLACK RESIST COMPOSITION FOR COLOR FILTER
Abstract:
Disclosed is a black resist composition for color filters which contains titanium black (A) having an average primary particle size of not more than 100 nm, carbon black (B) having an average primary particle size of not more than 60 nm, an acrylic copolymer dispersing agent (C) having an amino group and/or a quaternary ammonium salt, an organic solvent (D) and a binder resin (E) having a carboxyl group and an ethylenically unsaturated group. In this black resist composition, the mass ratio between the titanium black as the component (A) and the carbon black as the component (B) is 100:5-1000. With such a black resist composition for color filters, a pattern can be easily formed by a photolithography process, and can be made thin with sufficient sensitivity and resolution while exhibiting excellent light-blocking properties and insulating properties.