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Machine translation
1. (WO2005109486) SYSTEM FOR HEAT TREATMENT OF SEMICONDUCTOR DEVICE
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2005/109486    International Application No.:    PCT/KR2005/001393
Publication Date: 17.11.2005 International Filing Date: 12.05.2005
Chapter 2 Demand Filed:    13.03.2006    
IPC:
H01L 21/324 (2006.01)
Applicants: VIATRON TECHNOLOGIES INC. [KR/KR]; 508-1, Daeryung Technotown 3Cha, 448 Gasan-Dong, Geumcheon-Gu Seoul 153-803 (KR) (For All Designated States Except US).
KIM, Hyoung June [KR/KR]; (KR) (For US Only).
SHIN, Dong Hoon [KR/KR]; (KR) (For US Only)
Inventors: KIM, Hyoung June; (KR).
SHIN, Dong Hoon; (KR)
Agent: SUH, Man Kyu; 3/F, Jung-an Bldg., 827-64 Yoksam-dong, Kangnam-Ku Seoul 135-080 (KR)
Priority Data:
10-2004-0033617 12.05.2004 KR
10-2005-0017004 28.02.2005 KR
10-2005-0017005 28.02.2005 KR
10-2005-0027742 01.04.2005 KR
Title (EN) SYSTEM FOR HEAT TREATMENT OF SEMICONDUCTOR DEVICE
(FR) SYSTEME POUR TRAITEMENT THERMIQUE DE DISPOSITIF A SEMICONCDUCTEUR
Abstract: front page image
(EN)Disclosed is a heat treatment system for semiconductor devices. The heat treatment system is used in a heat treatment process for semiconductor devices, such as a crystallization process for an amorphous silicon thin film or a dopant activation process for a poly-crystalline silicon thin film formed on a surface of a glass substrate of a flat display panel including a liquid crystal display (LCD) or an organic light emitting device (OLED). The heat treatment system transfers a semiconductor device after uniformly preheating the semiconductor device in order to prevent deformation of the semiconductor device during the heat treatment process, rapidly performs the heat treatment process under the high temperature condition by heating the semiconductor device using a lamp heater and induction heat derived from induced electromotive force, and unloads the semiconductor device after uniformly cooling the semiconductor devices such that the semiconductor device is prevented from being deformed when the heat treatment process has been finished. The heat treatment system rapidly performs the heat treatment process while preventing deformation of the semiconductor device by gradually heating or cooling the semiconductor device.
(FR)L'invention concerne un système de traitement thermique pour dispositif à semiconducteur, utilisé selon un procédé de traitement thermique, du type cristallisation pour film mince au silicium amorphe, ou activation par dopant pour film mince au silicium polycristallin, établi sur une surface de substrat en verre ou écran plat, y compris un écran à cristaux liquides ou un dispositif OLED. Le système transfère le dispositif à semiconducteur après préchauffage uniforme pour éviter les déformations durant l'opération, conduit cette opération rapidement à température élevée en utilisant un appareil chauffant à lampe et la chaleur d'induction provenant d'une force électromotrice induite, puis décharge le dispositif après refroidissement uniforme pour éviter les déformations une fois l'opération terminée. L'opération est donc rapide, sans déformation, avec chauffage et refroidissement progressifs.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KP, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NG, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: Korean (KO)