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1. (WO2005105873) RESIN FOR RESIST COMPOSITION, NEGATIVE RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2005/105873    International Application No.:    PCT/JP2005/007391
Publication Date: 10.11.2005 International Filing Date: 18.04.2005
IPC:
C08F 220/28 (2006.01), G03F 7/038 (2006.01), H01L 21/027 (2006.01)
Applicants: TOKYO OHKA KOGYO CO., LTD. [JP/JP]; 150, Nakamaruko, Nakahara-ku, Kawasaki-shi Kanagawa 2110012 (JP) (For All Designated States Except US).
IWASHITA, Jun [JP/JP]; (JP) (For US Only).
TACHIKAWA, Toshikazu [JP/JP]; (JP) (For US Only).
KUBOTA, Naotaka [JP/JP]; (JP) (For US Only)
Inventors: IWASHITA, Jun; (JP).
TACHIKAWA, Toshikazu; (JP).
KUBOTA, Naotaka; (JP)
Agent: TANAI, Sumio; 2-3-1, Yaesu Chuo-ku, Tokyo 1048453 (JP)
Priority Data:
2004-131115 27.04.2004 JP
2004-263753 10.09.2004 JP
Title (EN) RESIN FOR RESIST COMPOSITION, NEGATIVE RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
(FR) RÉSINE POUR COMPOSITION DE RÉSIST, COMPOSITION DE RÉSIST NÉGATIVE ET PROCÉDÉ D'ÉLABORATION DE MOTIF DE RÉSIST
(JA) レジスト組成物用樹脂、ネガ型レジスト組成物及びレジストパターン形成方法
Abstract: front page image
(EN)A resin for a resist composition, which comprises a constituting unit (a1) containing an alicyclic group having a fluorinated hydroxyalkyl group, and a constituting unit (a2) being derived from an acrylic acid ester and containing a hydroxyl group-containing alicyclic group; and a negative resist composition which comprises the above resin for a resist composition. A resist pattern is formed by the use of the negative resist composition.
(FR)Il est prévu une résine pour composition de résist comprenant une unité constitutive (a1) contenant un groupe alicyclique ayant un groupe hydroxyalkyle fluoré, et une unité constitutive (a2) étant dérivée d’un ester d'acide acrylique et contenant un groupe alicyclique contenant un groupe hydroxyle ; et une composition de résist négative comprenant la résine ci-dessus pour composition de résist. Un motif de résist est formé à l’aide de la composition de résist négative.
(JA) フッ素化されたヒドロキシアルキル基を有する脂環式基を含有する構成単位(a1)と、アクリル酸エステルから誘導される構成単位であって、水酸基含有脂環式基を含む構成単位(a2)とを有するレジスト組成物用樹脂。このレジスト組成物用樹脂を用いてネガ型レジスト組成物とし、これを用いてレジストパターンを形成する。
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, KE, KG, KM, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)