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Pub. No.:    WO/2005/105269    International Application No.:    PCT/JP2005/007908
Publication Date: 10.11.2005 International Filing Date: 26.04.2005
B01D 53/14 (2006.01), F24F 7/00 (2006.01), F24F 7/06 (2006.01), H01L 21/027 (2006.01)
Applicants: DAIKIN INDUSTRIES, LTD. [JP/JP]; Umeda Center Building, 4-12, Nakazakinishi 2-chome, Kita-ku, Osaka-shi, Osaka 5308323 (JP) (For All Designated States Except US).
OHNO, Masao [JP/JP]; (JP) (For US Only).
SAHARA, Yoshio [JP/JP]; (JP) (For US Only).
TETSUYA, Katsuhiro [JP/JP]; (JP) (For US Only).
MATSUMOTO, Takao [JP/JP]; (JP) (For US Only)
Inventors: OHNO, Masao; (JP).
SAHARA, Yoshio; (JP).
TETSUYA, Katsuhiro; (JP).
Agent: ONDA, Hironori; 12-1, Ohmiya-cho 2-chome Gifu-shi, Gifu 5008731 (JP)
Priority Data:
2004-133663 28.04.2004 JP
(JA) 気体浄化装置
Abstract: front page image
(EN)Reflow means (L3) is provided in a gas purifying device, and the means causes liquid discharged from an element positioned on the downstream side of an airflow to reflow to a liquid circulation system path of an element positioned on the upstream side of the air flow. The liquid dissolves and removes low-concentration contaminant by gas-liquid contact, and this causes the liquid to lose the capability of dissolving and removing contaminant. The liquid is discharged from the element on the downstream side and is made to reflow to the element on the upstream side through reflow means, and contaminant is dissolved and removed by gas-liquid contact between the liquid and non-purified air containing high-concentration contaminant.
(FR)Une méthode de reflux (L3) est fournie dans un dispositif de purification du gaz ; la méthode amène le liquide déchargé d'un élément placé en aval d'un flux d'air à refluer vers un parcours du système de circulation du liquide d'un élément positionné du côté amont du flux d'air. Le liquide se dissout et retire le contaminant à faible concentration par contact avec le gaz-liquide et ceci amène le liquide à perdre sa capacité de dissolution et de retrait du contaminant. Le liquide est déchargé de l'élément côté aval et amené à refluer vers les éléments du côté amont via la méthode de reflux ; le contaminant est dissous et retiré par contact gaz-liquide entre le liquide et l'air non purifié contenant un contaminant très concentré.
(JA) 空気流れの下流側に位置するエレメントから排出される液体を、空気流れの上流側に位置するエレメントの液体循環系路に還流させる還流手段L3を設けて、低濃度の汚染物質との気液接触で汚染物質を溶解除去することにより、汚染物質の溶解除去能力を発揮できなくなって下流側のエレメントから排出された液体が、還流手段を介して上流側のエレメントへ還流されて、高濃度の汚染物質を含む非清浄空気との気液接触により汚染物質の溶解除去が行われる。
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, KE, KG, KM, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)